Method and device for transferring decorative segment of embossing film

A technology of embossed film and segments, which is applied in the fields of crafts, decorative arts, and rotary printing machines for producing decorative surface effects, and can solve problems such as interference in the processing of embossed films

Active Publication Date: 2018-04-17
LEONHARD KURZ STIFTUNG & CO KG +1
View PDF10 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Without adhering to the substrate, the flakes are attached to the substrate-adhered portion of the decorative segment applied to the substrate and may remain attached thereto in an uncontrolled manner during further processing. on or off, causing interference during processing of the embossed film and / or substrate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and device for transferring decorative segment of embossing film
  • Method and device for transferring decorative segment of embossing film
  • Method and device for transferring decorative segment of embossing film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0058] figure 1 and 2 A first exemplary embodiment of an embossing device 1 according to the invention is shown schematically.

[0059] In the illustrated embodiment, the embossing device 1 is configured as a lifting embossing device and is used for a roll-to-roll method, in which the substrate 2 to be embossed and the embossing film 3 are supplied on a storage roll 4 .

[0060] The embossed film 3 comprises a carrier film 31, a release layer 32, a transfer layer 33 and an adhesive layer 34 (see image 3 ). under the Figure 9 The structure of the embossed film 3 is described in more detail in .

[0061] The embossing film 3 and the substrate 2 are fed to an embossing station 5 with a vertically movable embossing mold 6 , wherein the underside of the substrate 2 rests on an embossing support 7 in the embossing station 5 . The embossing film 3 is situated with its adhesive layer on the upper side of the substrate 2 . Alternatively (not shown), the stamping die can also be...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a method for transferring a decorative segment (3d) of an embossing film (3) onto a substrate (2) by means of an embossing stamp (6), wherein the embossing film (3) comprisesa carrier film (31) and a transfer layer (33) arranged on the carrier film (31). The method comprises the following steps: a) providing the embossing film (3); b) embossing or pressing at least one compression segment (8v) spaced apart from the edge of the decorative segment (3d) into the transfer layer (33); c) embossing the decorative segment (3d) onto the substrate (2); d) removing the remaining embossing film (3r) from the substrate (2), which has been embossed with the decorative segment (3d). The invention further relates to a device for performing the method.

Description

technical field [0001] The invention relates to a method and a device for transferring a decorative segment of an embossed film onto a substrate. Background technique [0002] When applying embossed films (which contain in particular strongly crosslinked paint systems, for example UV crosslinked paint systems and / or paint systems with high layer thicknesses in the paint stack, i.e. the transferred layer thickness of the carrierless film is greater than 5 microns), it is only very difficult to produce clean separation edges during embossing. Furthermore, in these cases the detachment of the membrane complex does not take place at the edge of the application tool, but at an indeterminate position. Through intensive crosslinking, relatively long or very long polymer chains are formed in the lacquer, thereby correspondingly influencing the physical properties of the lacquer. Depending on the hardness of strongly crosslinked lacquers, for example relatively hard and brittle var...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B44B5/02B44C1/17
CPCB44B5/028B44C1/1729B41F19/068B44B5/02
Inventor M·伯尔克哈德特T·曼斯费尔德G·阿蒙T·勒赫纳
Owner LEONHARD KURZ STIFTUNG & CO KG
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap