A selective emitter manufacturing method of wet black silicon and a solar cell

Abstract

The invention discloses a manufacturing method of a selective emitter of wet black silicon and a solar cell. The method comprises the steps of carrying out wet texturing on a silicon wafer to form a black silicon surface; carrying out diffusion on the black silicon surface to form an n-type element-doped region; carrying out laser grooving in an area, corresponding to the position at which a metalgrid line is to be manufactured, of the black silicon surface, gathering n-type elements in the n-type element-doped region into a laser grooved area by using a laser ablation mode and forming an n+area with a preset depth to form the selective emitter. The solar cell comprises the selective emitter on the black silicon surface; and the metal grid line is arranged in the selective emitter. According to the manufacturing method of the selective emitter of the wet black silicon and the solar cell, the charge transfer performance between the cell and the grid line can be promoted and the photoelectric conversion efficiency of a wet black silicon cell is improved.

Description

technical field [0001] The invention belongs to the technical field of photovoltaic equipment manufacturing, and in particular relates to a method for manufacturing a selective emitter of wet-process black silicon and a solar cell. Background technique [0002] At present, the energy crisis is threatening the survival and development of human beings. Compared with non-renewable fossil energy, solar energy resources are clean and renewable. Solar cells can realize the effective use of solar energy resources. Among the many types of solar cells, crystalline silicon solar cells have the highest degree of industrialization, the widest range of applications, and the most mature technology, and have always been one of the fastest-growing types of solar cells. [0003] With the development of silicon wafer diamond wire sawing process, the cost of silicon solar cells keeps decreasing. Metal-catalyzed wet texturing is an effective texturing method for diamond wire-cut polysilicon wa...

AI Technical Summary

Problems solved by technology

Metal-catalyzed wet texturing is an effective texturing method for diamond wire-cut polysilicon wafers. Metal-catalyzed wet texturing needs to match a higher diffusion resistance to obtain higher photoelectric conversion efficiency. The existing wet black silicon process Among them, the square resistance of the silicon wafer reaches 120Ω after diffusion, but the higher square resistance is not conducive to the charge transmission between the cell and the grid line, so it is not conducive to the contact of the grid line battery in the later screen printing process.

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