PCB (printed circuit board) isolation graph copper pouring and distributing secondary etching method
A secondary etching and patterning technology, applied in chemical/electrolytic methods to remove conductive materials, electrical components, printed circuit manufacturing, etc., can solve uneven distribution of patterns, difficulty in consistent current density, uniformity of etching patterns, and pattern tolerances Difficulty and other issues
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0023] A method for secondary etching of PCB isolated pattern copper laying shunt, comprising the following steps:
[0024] a. Optimizing copper laying film;
[0025] b. Graphic transfer;
[0026] c. Graphic plating;
[0027] d. Graphic etching;
[0028] e. The second graphics transfer;
[0029] f. The second etching;
[0030] Wherein, the a step includes making the PCB production draft film, when making the film, a copper block matrix with a side length of 0.5mm is set around the isolated figure, the distance between the copper block matrix is 0.2mm, and all figures are made by compensating 1.5mil film data;
[0031] The parameters of the e-step are: Die: lamination speed 2.0±0.5m / min, lamination temperature 110±5°C; exposure: unilateral compensation of 3mil for copper laying and window opening; equipment table vacuum -350mmHg, exposure ruler 7 grid; development: development point control 55 ± 5%.
[0032] The step d is alkaline etching; the step f is acid etching, th...
Embodiment 2
[0035] A method for secondary etching of PCB isolated pattern copper laying shunt, comprising the following steps:
[0036] a. Optimizing copper laying film;
[0037] b. Graphic transfer;
[0038] c. Graphic plating;
[0039] d. Graphic etching;
[0040] e. The second graphics transfer;
[0041] f. The second etching;
[0042] Wherein, described a step comprises making PCB production manuscript film, when making film, set the copper block matrix of side length 0.6mm around the isolated figure, the distance between copper block matrix is 0.3mm, all figures are made film data by compensation 1.7mil;
[0043] The parameters of the e-step are: Die: lamination speed 2.0±0.5m / min, lamination temperature 110±5°C; exposure: unilateral compensation of 4mil for copper laying and windowing; equipment table vacuum -360mmHg, exposure ruler 7 grid; development: development point control 55 ± 5%.
[0044] The step d is alkaline etching; the step f is acid etching, the parameters are ...
Embodiment 3
[0046] A method for secondary etching of PCB isolated pattern copper laying shunt, comprising the following steps:
[0047] a. Optimizing copper laying film;
[0048] b. Graphic transfer;
[0049] c. Graphic plating;
[0050] d. Graphic etching;
[0051] e. The second graphics transfer;
[0052] f. The second etching;
[0053] Wherein, described a step comprises making PCB production manuscript film, when making film, arrange the copper block matrix of side length 0.3mm around the isolated figure, the spacing between copper block matrix is 0.2mm, all figures are made film data by compensation 2mil;
[0054] The parameters of the e-step are: Die: lamination speed 2.0±0.5m / min, lamination temperature 110±5°C; exposure: unilateral compensation of 5mil for copper laying and windowing; equipment table vacuum -370mmHg, exposure ruler 7 grid; development: development point control 55 ± 5%.
[0055] The step d is alkaline etching; the step f is acid etching, the parameters are...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com