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Method for improving self discharge of super capacitor

A supercapacitor and self-discharge technology, which is applied in the field of electrochemistry, can solve problems such as hindering the promotion of supercapacitors, complex processes, and poor stability of supercapacitors, and achieve the effect of improving self-discharge performance and low energy consumption

Active Publication Date: 2018-06-29
柔电(武汉)科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0020] Self-discharge is a key indicator that determines the performance of supercapacitors. Compared with chemical energy storage, the characteristic of large self-discharge greatly hinders the further promotion of supercapacitor market applications. Therefore, improving the self-discharge of supercapacitors is an urgent need for us to solve Traditional methods for improving supercapacitors mainly start with raw materials and production processes, including pore structure control and surface functional group treatment of activated carbon, control of diaphragm thickness and pore size, and optimization of drying and aging processes; However, these methods for improving supercapacitors are not only complicated, but also have poor stability during use.

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  • Method for improving self discharge of super capacitor

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Embodiment 1

[0058] The first embodiment of the present invention provides a method for improving self-discharge of a supercapacitor. The method includes the following steps:

[0059] 1) Put the activated carbon electrode as the substrate into the vacuum reaction chamber of the atomic layer deposition equipment;

[0060] 2) Pass trimethyl aluminum vapor into the vacuum reaction chamber, and the trimethyl aluminum vapor reacts with the surface functional groups of the activated carbon electrode; the surface functional groups of the activated carbon electrode include carboxyl groups, carboxylic anhydrides, lactone groups, phenol groups, Quinone, ether and carbonyl; taking -COOH as an example, the reaction involved can be divided into the following two steps:

[0061]

[0062] 3) Use high-purity argon to flush the trimethylaluminum vapor that has not participated in the reaction and the byproducts produced by the reaction;

[0063] 4) Use trimethyl aluminum as aluminum source and use H 2 O is the oxy...

Embodiment 2

[0073] The second embodiment of the present invention provides a method for improving self-discharge of a supercapacitor. The method includes the following steps:

[0074] 1) Put the activated carbon electrode as the substrate into the vacuum reaction chamber of the atomic layer deposition equipment;

[0075] 2) Pour TiCl into the vacuum reaction chamber 4 Steam, TiCl 4 The steam reacts with the surface functional groups of the activated carbon electrode;

[0076] 3) Use high-purity argon to flush TiCl that has not participated in the reaction 4 Steam and by-products from the reaction;

[0077] 4) Take TiCl 4 As the titanium source, with H 2 O is the oxygen source, and the cyclic reaction is carried out as follows: pass TiCl 4 Vapor, atomic layer deposition; flush the unreacted TiCl with high-purity Ar gas 4 And by-products produced by the reaction; pass water vapor, water vapor and TiCl 4 The molecules of the vapor react to form TiO 2 Membrane; Use high-purity Ar gas to flush the wate...

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Abstract

The invention belongs to the technical field of electrochemistry, and in particular relates to a method for improving self discharge of a super capacitor. The method comprises the following steps: 1)putting an activated carbon electrode as a substrate in a vacuum reaction chamber; 2) introducing first precursor gas into the vacuum reaction chamber, wherein the first precursor gas is reacted witha surface functional group of the activated carbon electrode; 3) flushing the electrode with inert gas; and 4) introducing the first precursor gas as a metal source and the second precursor gas as anoxygen source into the vacuum reaction chamber and carrying out atomic layer deposition circulation in an inert gas atmosphere till forming a metal oxide film with a targeted thickness. The metal oxide is deposited to the surface of the activated carbon electrode to form a coating layer by means of the atomic layer deposition technology, so that the surface structure of the carbon electrode is improved, and the stability of the super capacitor in the using process is enhanced; and the purpose of simply and precisely controlling the thickness needed by growth of a film can be achieved by controlling the periodicity of the reaction.

Description

Technical field [0001] The invention belongs to the field of electrochemical technology, and particularly relates to a method for improving the self-discharge of a super capacitor. Background technique [0002] With the expansion of the field of use of supercapacitors, some of its own shortcomings have also been exposed to the public. The first is self-discharge, which has a significant impact on the energy storage capacity and cycle stability of supercapacitors. When the super capacitor is independent of the external circuit, the self-discharge is caused by the parasitic current passing through one of the positive and negative electrodes or a pair of independent electrodes. Its generation can be attributed to the following reasons: [0003] 1) When the electrode / electrolyte surface voltage is higher than the electrolyte decomposition voltage, a redox reaction will occur. This process will produce a self-discharge caused by a voltage-controlled Faraday impedance, which is proportio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01G11/84H01G11/86H01G11/30H01G11/32H01G11/46C23C16/40C23C16/455
CPCC23C16/40C23C16/45553H01G11/30H01G11/32H01G11/46H01G11/84H01G11/86Y02E60/13
Inventor 于圣明胡韬解明
Owner 柔电(武汉)科技有限公司
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