A method for improving the self-discharge of supercapacitors
A supercapacitor and self-discharge technology, which is applied in the field of electrochemistry, can solve problems such as complicated process, hindering the promotion of supercapacitors, and poor stability of supercapacitors, and achieves the effect of low energy consumption and improved self-discharge performance
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Embodiment 1
[0058] Embodiment 1 of the present invention provides a method for improving the self-discharge of a supercapacitor, the method comprising the following steps:
[0059] 1) Put the activated carbon electrode as the substrate into the vacuum reaction chamber of the atomic layer deposition equipment;
[0060] 2) Introduce trimethylaluminum vapor into the vacuum reaction chamber, and the trimethylaluminum vapor reacts with the surface functional groups of the activated carbon electrode; the surface functional groups of the activated carbon electrode include carboxyl, carboxylic anhydride, lactone, phenol, Quinone group, ether group and carbonyl group; taking -COOH as an example, the participating reactions can be divided into the following two steps:
[0061]
[0062] 3) Use high-purity argon to flush the unreacted trimethylaluminum vapor and the by-products produced by the reaction;
[0063] 4) With trimethylaluminum as the aluminum source, with H 2 O is an oxygen source, an...
Embodiment 2
[0073] Embodiment 2 of the present invention provides a method for improving the self-discharge of a supercapacitor, the method comprising the following steps:
[0074] 1) Put the activated carbon electrode as the substrate into the vacuum reaction chamber of the atomic layer deposition equipment;
[0075] 2) Pass TiCl into the vacuum reaction chamber 4 Vapor, TiCl 4 The vapor reacts with the surface functional groups of the activated carbon electrode;
[0076] 3) Flush the unreacted TiCl with high-purity argon 4 Vapor and reaction by-products;
[0077] 4) with TiCl 4 as titanium source, with H 2 O is the oxygen source, and the following cycle reaction is carried out: feed TiCl 4 Vapor, for atomic layer deposition; flush unreacted TiCl with high-purity Ar gas 4 And the by-products produced by the reaction; water vapor, water vapor and TiCl 4 Molecules of the vapor react to form TiO 2 Thin film; use high-purity Ar gas to flush the water vapor that has not participated ...
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