Manufacture method of semiconductor device

Abstract

Provided is a semiconductor device and a manufacture method of the semiconductor, wherein the method includes forming a silicon-based resin over a substrate. In various embodiments, the silicon-basedresin includes a nitrobenzyl functional group. In some embodiments, a baking process is performed to cross-link the silicon-based resin. Thereafter, the cross-linked silicon-based resin is patterned and an underlying layer is etched using the patterned cross-linked silicon-based resin as an etch mask. In various examples, the cross-linked silicon-based resin is exposed to a radiation source, thereby de-cross-linking the silicon-based resin. In some embodiments, the de-cross-linked silicon-based resin is removed using an organic solution.

Description

technical field [0001] Embodiments of the present invention relate to a method for fabricating a semiconductor device, and more particularly relate to the material composition of a part of the lithography process. Background technique [0002] The electronic industry has an increasing demand for smaller and faster electronic devices, and the electronic devices simultaneously provide a large number of complex functions. To sum up, the continuous trend of the semiconductor industry is to manufacture low-cost, high-performance, and low-power integrated circuits. These long-range goals can be achieved by shrinking the integrated circuit size (eg, minimum structure size) of semiconductors, thereby improving throughput and reducing associated costs. However, shrinking the size also increases the complexity of the IC manufacturing process. In order to achieve continued advances in semiconductor integrated circuits and devices, similar advances in semiconductor processes and techn...

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Problems solved by technology

However, in at least some cases, removing one or more layers of a bilayer or multilayer photoresist structure may also etch (ie, damage) underlying layers.

[0004]As a result, existing technology cannot fully satisfy all aspects

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