A bidirectional transient voltage suppression diode and its manufacturing method
A transient voltage suppression and transient suppression technology, applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., can solve the problems of large reverse leakage, poor heat dissipation, complex process, etc., and achieve low contact resistance and heat dissipation performance. The effect of a good, wide process operating window
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[0038] Below in conjunction with accompanying drawing and specific embodiment the present invention is described in further detail:
[0039] Such as figure 1 As shown, the unidirectional transient voltage suppression diode tube core in the present invention includes a silicon chip 1, a passivation protection layer 2, a first electrode and a second electrode, and the first electrode is successively a metal titanium layer 3 and a metal nickel layer from inside to outside. Layer 5 and metal silver layer 4; the same structure as the second electrode and the first electrode, with metal titanium layer 6, metal nickel layer 7 and metal silver layer 8 in sequence from inside to outside.
[0040] Silicon wafer 1 is an N-type silicon wafer, adopting N type, with a thickness of 220 μm, forming a PN junction through diffusion, and passivating the exposed PN junction to form a passivation protection layer 2, with a thickness of 1-2 μm.
[0041] Metal titanium layers 3 and 6 on the surface...
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