The invention belongs to the field of design and manufacturing of semiconductors / integrated circuits, and particularly relates to a manufacturing method of a large-through-flow and small-area TVS (
Transient Voltage Suppressor) device. Firstly, a P-type substrate with proper resistivity is selected, and an N-type epitaxial layer is grown on the P-type substrate by using a
chemical vapor deposition process; and forming an
oxide layer,
etching a deep isolation groove, and filling
polycrystalline silicon for isolation. And performing
ion implantation between the isolation grooves to form P-type traps,
etching the grooves, filling N-type doped
polycrystalline silicon, and sealing the grooves. And removing the
surface layer, performing high-temperature
diffusion, depositing a through hole
dielectric layer, forming a through hole, and filling conductive
metal into the through hole. And finally, depositing
metal and photoetching to reserve
metal in a specific area, and passivating to form the TVS device. By optimizing the structure and the process, large through-flow and small area are realized, the cost is reduced, the requirements of miniaturized electronic products are met, and the performance and the reliability of
electronic equipment are improved.