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73results about How to "Lower clamping voltage" patented technology

Anti-surge protection circuit

The invention relates to an anti-surge protection circuit connected between a power supply and electronic equipment. The anti-surge protection circuit comprises a first-stage protection circuit, a second-stage protection circuit and an inductance element, wherein the first-stage protection circuit and the second-stage protection circuit are connected in parallel and instantaneously discharge the surge currents of a signal input end; the inductance element is connected in series between the first-stage protection circuit and the second-stage protection circuit and inhibits the surge currents of the first-stage protection circuit from flowing into the second-stage protection circuit; and the second-stage protection circuit comprises a second voltage dependent resistor and a capacitor. The anti-surge protection circuit not only enables most surges to be discharged on the first-stage protection circuit, but also effectively solves the problems of current following and current leakage of the first-stage protection circuit through the effective matching action of the first-stage protection circuit, the second-stage protection circuit and the inductance element; in addition, spike voltages and clamp voltages which are generated from the first-stage protection circuit are greatly reduced, therefore the surge protection efficiency of the integral protection circuit is enhanced, the service life of the protection circuit is prolonged, and the safety of the protection circuit is greatly enhanced.
Owner:SHENZHEN BENCENT ELECTRONICS CO LTD

Surge protection circuit for signal circuit

The invention discloses a surge protection circuit for a signal circuit. The surge protection circuit for the signal circuit comprises a primary protection circuit, a secondary protection circuit and a resistor element. The primary protection circuit and the secondary protection circuit are connected in parallel with a protected circuit; the resistor element with low resistance is connected in series between the primary protection circuit and the secondary protection circuit. The primary protection circuit comprises a piezoresistor and a diode or a piezoresistor and a magnetic bead; the piezoresistor is connected in series with the diode or the magnetic bead; and the secondary protection circuit comprises a piezoresistor with low capacitance. Under a normal operation condition of a line, the primary protection circuit and the secondary protection circuit are in a high-impedance state, and thus, influence on signal transmission is small. When a surge peak is generated, a quick response is made by the primary protection circuit so as to discharge a surge in low-impedance state; surge current is further restrained by the resistor element so as to reduce the surge flowing into the secondary protection circuit; and a clamp voltage is further reduced by the piezoresistor in the secondary protection circuit, so that a protection level is improved.
Owner:SHENZHEN SUNLORD ELECTRONICS

Transient voltage suppression device and manufacturing method thereof

The invention discloses a transient voltage suppression device and a manufacturing method thereof. The transient voltage suppression device comprises a semiconductor substrate, a first epitaxial layer located on the semiconductor substrate, a plurality of isolation structures, a plurality of first groove structures, a first injection region and a second injection region; the isolation structures penetrate through the first epitaxial layer and extend into the semiconductor substrate, the plurality of isolation structures divide the transient voltage suppressor into a plurality of regions in the transverse direction, the plurality of regions comprise a voltage stabilization region and at least one group of guide diode regions, and each group of guide diode regions comprise a first region and a second region; the plurality of first groove structures are positioned in the voltage stabilization region and penetrate through the first epitaxial layer; the first injection region is located in the first epitaxial layer of the second region and the voltage stabilization region; and the second injection region is located in the first epitaxial layer of the first region and the second region. A clamping diode and a triode are formed in the voltage stabilization region, the clamping diode and the triode form a composite voltage stabilizing tube, the clamping diode and the triode share current at the same time, the peak-peak value current in the breakdown direction is improved, the clamping voltage during large current conduction is reduced, and the size of the device is reduced.
Owner:HANGZHOU SILAN INTEGRATED CIRCUIT

Bidirectional transient voltage suppression device and preparation method thereof

ActiveCN113380787ALower breakdown voltageLarge negative resistance characteristicsTransistorSolid-state devicesHemt circuitsEngineering
The invention discloses a bidirectional transient voltage suppression device and a preparation method thereof, which belong to the field of semiconductor protection devices. Thebidirectional transient voltage suppression device comprises a substrate and a well region. The well region comprises a first preset region and a second preset region, and the first preset region comprises first doped regions arranged at intervals; the second preset region comprises field doped regions which are arranged in the well region at intervals andsecond doped regions. The second doped regions are arranged between the field doped regions, the adjacent sides of the second doped regions are tightly attached to the field doped regions, and the second doped regions are located on the upper surfaces of the first doped regions respectively; the field oxide layer is formed in the field doped region and protrudes out of the field dopedregion. The technical scheme of the invention has the beneficial effects that the characteristics of low breakdown voltage and higher negative resistance characteristic are simultaneously realized, so that the characteristics of lower clamping voltage, ultralow trigger voltage and ultralow clamping voltage are realized, and the capability of protecting a post-stage circuit is higher.
Owner:SHANGHAI CHANGYUAN WAYON MICROELECTRONICS

TVS protection device based on P-type SOI substrate, and manufacturing method thereof

The invention discloses a TVS protection device based on a P-type SOI substrate. According to the device, a P-type SOI substrate silicon wafer is adopted, and is packaged by a metal frame; a P-type SOI substrate comprises a P-substrate, an oxide buried layer and a P-layer from bottom to top, has three ends of an IO end, a VCC end and a grounding end, and can protect the IO signal end and the powersupply VCC end in a circuit at the same time; a first capacitance reducing diode and a second capacitance reducing diode on the P-layer are formed by P-/N-junctions on the front surface; and a main TVS8 pipe is formed by three N+/P-substrate arrays on the back surface. According to the invention, the device is manufactured on the front side and the back side at the same time, so that the layout area of the single device is small so as to easily improve the yield and reduce the cost; the two capacitance reducing diodes have low capacitance values, and completely eliminates the substrate parasitic capacitance, so that the device is suitable for being used in high-frequency interfaces such as HDMI2.0, USB3.0 and other high-speed ports; and large surge current can pass through the TVS pipe onthe back surface.
Owner:SHANGHAI CHANGYUAN WAYON MICROELECTRONICS

A bidirectional low-voltage planar transient voltage suppression diode and a manufacturing method thereof

The invention discloses a bidirectional low-voltage planar transient voltage suppression diode and a manufacturing method thereof, comprising a P-type heavily doped silicon substrate; A first front doping region and a first back doping region are respectively formed on the front and back sides of the substrate, A second front doping region and a second back doping region are respectively formed bydiffusion doping through a doping window on the front surface and the back surface of the substrate, a second front doped region oxide layer and a second back doped region oxide layer are formed on the second front doped region and the second back doped region, respectively, a front contact hole and a back contact hole are formed on the second front doped region oxide layer and the second back doped region oxide layer; A front metal electrode and a back metal electrode are formed on the front contact hole and the back contact hole, respectively. A front doping region and a back doping regionwith the same doping type as the silicon substrate are added so as to adjust the substrate concentration, thereby increasing the concentration gradient across the formed PN junction, reducing the movable ions and reducing the TVS leakage current.
Owner:西安卫光科技有限公司

Unidirectional high-voltage transient voltage suppression protection device and preparation method thereof

An unidirectional high-voltage transient voltage suppression protection device comprises a substrate of a first conductive type; a first epitaxial layer of a second conductivity type, the first epitaxial layer being formed over the top surface of the substrate; a semiconductor layer in a second conductivity type, the semiconductor layer being a well region formed in the top surface of the first epitaxial layer or a second epitaxial layer formed above the top surface of the first epitaxial layer; a group of first injection regions and second injection regions formed in the top surface of the semiconductor layer, the first injection region being formed on the periphery of the second injection region, and the first injection region and the second injection region being horizontally spaced bya preset distance; and a first isolation groove on the periphery of the first injection region, the first isolation groove being formed in the substrate, the first epitaxial layer and the semiconductor layer, and the first isolation groove being filled with an insulating material. The embodiment of the invention provides a unidirectional high-working-voltage transient voltage suppression protection device of a transient voltage suppression protection device.
Owner:WILL SEMICON (SHANGHAI) CO LTD
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