The invention discloses a transient
voltage suppression device and a manufacturing method thereof. The transient
voltage suppression device comprises a
semiconductor substrate, a first epitaxial layer located on the
semiconductor substrate, a plurality of isolation structures, a plurality of first groove structures, a first injection region and a second injection region; the isolation structures penetrate through the first epitaxial layer and extend into the
semiconductor substrate, the plurality of isolation structures divide the
transient voltage suppressor into a plurality of regions in the transverse direction, the plurality of regions comprise a
voltage stabilization region and at least one group of guide
diode regions, and each group of guide
diode regions comprise a first region and a second region; the plurality of first groove structures are positioned in the voltage stabilization region and penetrate through the first epitaxial layer; the first injection region is located in the first epitaxial layer of the second region and the voltage stabilization region; and the second injection region is located in the first epitaxial layer of the first region and the second region. A clamping
diode and a
triode are formed in the voltage stabilization region, the clamping diode and the
triode form a composite voltage stabilizing tube, the clamping diode and the
triode share current at the same time, the peak-
peak value current in the breakdown direction is improved, the clamping voltage during large
current conduction is reduced, and the size of the device is reduced.