Mask plate and making method thereof

A manufacturing method and mask technology, which are used in semiconductor/solid-state device manufacturing, ion implantation plating, coating, etc., can solve the problems of mask wrinkles and poor mechanical strength, reduce wrinkles, improve mechanical strength, The effect of improving uniformity

Active Publication Date: 2018-07-13
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Masks are more prone to wrinkling after stretching due to their thinner masks resulting in poorer mechanical strength

Method used

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  • Mask plate and making method thereof
  • Mask plate and making method thereof
  • Mask plate and making method thereof

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Embodiment Construction

[0038] In order to enable those skilled in the art to better understand the technical solution of the present invention, the mask provided by the present invention and its manufacturing method will be described in detail below with reference to the accompanying drawings.

[0039] Please also refer to figure 1 and figure 2 , the mask plate 1 provided by the first embodiment of the present invention includes a pattern layer 11 and a tensile layer 12, wherein the pattern layer 11 is used as a mask plate to be in contact with the substrate when performing an evaporation process, and the pattern layer 11 A first opening 111 is provided in the center for forming thin film patterns deposited on the substrate. The stretched layer 12 faces away from the substrate during the vapor deposition process, and includes a stretched portion 12a and two clamping portions 12b, wherein the stretched portion 12a is arranged on the first surface ( figure 1 On the lower surface of the graphic laye...

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Abstract

The invention provides a mask plate and a making method thereof. The mask plate comprises a graph layer and a stretching layer, a first opening is formed in the graph layer, the stretching layer comprises a stretching portion and two clamping portions, the stretching portion is arranged on a first face of the graph layer, a second opening is formed in the stretching portion, orthographic projection of the second opening on the first face of the graph layer completely covers that of the first opening, and the two clamping portions respectively protrude from two opposite sides of the first faceof the graph layer. Inside stress uniformity can be improved, and mechanical strength is improved, so that wrinkles can be reduced.

Description

technical field [0001] The present invention relates to the technical field of mask making, in particular to a mask and a manufacturing method thereof. Background technique [0002] In the fabrication process of OLED devices, the organic layer of the device is usually fabricated by high vacuum evaporation. In the evaporation process, a high-precision metal mask (FMM) is required to produce three sub-pixel light-emitting layers of R, G, and B. The manufacturing process of the high-precision mask is to weld the mask with graphics on the mask frame, and the thickness of the mask is usually 20-50 microns. [0003] Before the mask plate is welded on the mask plate frame, it is also necessary to stretch the mask plate to make it tight so that the pattern of the mask plate reaches the set position. However, since the stretched mask is subjected to uneven internal stress, the middle portion thereof will bend downward, and wrinkles will also be generated on the surface of the mask....

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L51/56C23C14/04
CPCC23C14/042H10K71/166
Inventor 张峰杰
Owner BOE TECH GRP CO LTD
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