UV-resistant IM coating material
A technology of coating materials and disappearing film, which is applied in the optical field, can solve the problems of difficult grinding of zirconia, low density of a single material, and high cost of nano-sized zirconia, so as to reduce the impact of images, improve light transmittance, The effect of high UV resistance
Inactive Publication Date: 2018-07-17
JIANGSU RIJIU OPTOELECTRONICS LTD
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Problems solved by technology
[0006] The invention provides a coating material for UV-resistant shadow-eliminating film, which is used to solve the problem that the grinding degree of zirconia in the prior art is difficult, the cost of nano-sized zirconia is high, and the density between single materials is low. question
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[0019] In order to make the technical means, creative features, objectives and effects of the invention easy to understand, the present invention is further described.
[0020] The following is a specific description of the UV-resistant film coating material provided in this case in conjunction with the examples as follows:
[0021] The following form is the mass part statistics of four kinds of embodiment components that the present invention exemplifies:
[0022]
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Abstract
The invention relates to the optical field and discloses a UV-resistant IM coating material. The UV-resistant IM coating material comprises 5 to 20 parts of polyfunctional aliphatic polyurethane acrylic resin, 5 to 15 parts of nano-alpha-alumina, 1 to 7 parts of nano-hafnium oxide, 1 to 8 parts of nano-silica, 1 to 10 parts of a silicate solution, 2 to 7 parts of acrylmorpholine, 0.2 to 2.0 partsof a leveling agent, 1 to 3 parts of a photoinitiator and 28 to 83.8 parts of an organic solvent. Nano-silica is added and nano-zirconia is replaced with alumina, so that the use amount of zirconia iscompletely reduced, because nano-silica and nano-alumina are different, a gap between nano-silica and nano-alumina can be filled with each other while mixed, therefore, gaps among particles are better in density to solve the problem of lower density among single materials.
Description
technical field [0001] The invention relates to the field of optics, in particular to a coating material for an anti-UV shadow disappearing film. Background technique [0002] The disappearing film is an important basic material of the capacitor ITO conductive film. The capacitor ITO film is generally patterned in the later process, because the ITO line (ITO refractive index = 1.8) and the ITO-free area after etching (ordinary HC refractive index = 1.5) exist Large differences in refractive index cause pattern visibility, the so-called chromatic aberration, which will greatly affect the visual effect of TP during use. For this reason, shadow removal must be carried out, and there are usually two methods for shadow removal: [0003] ——Dry method: that is, sputtering multiple layers of metal oxides with different refractive indices on the PET substrate, and controlling the refractive index of each layer and the thickness of the coating to reduce chromatic aberration and achie...
Claims
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Patent Type & Authority Applications(China)
IPC IPC(8): C09D175/14C09D7/61C09D7/20
CPCC09D175/14C08K3/22C08K3/34C08K3/36C08K13/02C08K2003/2227C08K2003/2244C08K2201/011C08K2201/014
Inventor 任国伟
Owner JIANGSU RIJIU OPTOELECTRONICS LTD
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