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Vacuum pump, and flexible cover and rotor used in said vacuum pump

A vacuum pump and rotor technology, which is applied to the components, pumps, and pump components of the pumping device for elastic fluids to achieve the effect of inhibiting backflow, corrosion and rust.

Active Publication Date: 2018-08-31
EDWARDS JAPAN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] However, in the above-mentioned vacuum pump, there is a possibility that the process gas can pass through the slight gap between the cover and the rotor, which is ensured for absorbing the dimensional error of the parts when the pump is assembled, and the bolt surface may be generated. Rust or particles remaining in the recess flow back into the chamber

Method used

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  • Vacuum pump, and flexible cover and rotor used in said vacuum pump
  • Vacuum pump, and flexible cover and rotor used in said vacuum pump
  • Vacuum pump, and flexible cover and rotor used in said vacuum pump

Examples

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Embodiment

[0041] Hereinafter, a vacuum pump 1 according to an embodiment of the present invention will be described based on the drawings. In addition, hereinafter, regarding the words "upper" and "lower", the intake port side and the exhaust port side in the rotor axial direction correspond to upper and lower sides, respectively.

[0042] figure 1 It is a longitudinal sectional view showing the vacuum pump 1 . The vacuum pump 1 is a compound pump including a turbomolecular pump mechanism PA and a thread groove pump mechanism PB housed in a substantially cylindrical housing 10 .

[0043] The vacuum pump 1 includes: a housing 10; a rotor 20 having a rotor shaft 21 rotatably supported in the housing 10; a drive motor 30 for rotating the rotor shaft 21; Stator post 40.

[0044] The casing 10 is formed in a bottomed cylindrical shape. The housing 10 is composed of a base 11 with a gas exhaust port 11a formed on the lower side and a cylindrical portion 12 with a gas intake port 12a forme...

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Abstract

To provide a vacuum pump which suppresses the penetration of foreign matter such as rust or particles attributable to a process gas into a semiconductor wafer manufacturing process, and a flexible cover and a rotor for use in the vacuum pump. [Solution] A vacuum pump 1 is provided with: a casing 10 having a gas intake port 12a and a gas exhaust port 11a; and a rotor 20 which has a recessed portion29 opening toward the gas intake port 12a and which is fastened to a rotor shaft 21 by means of bolts 25 disposed in the recessed portion 29. In the recessed portion 29 is provided a flexible cover 80 which deforms elastically in a convex shape toward the recessed portion 29 and covers the recessed portion 29. An outer circumferential portion 80a of the flexible cover 80 is supported on an end surface 20a of the rotor 20 that faces the gas intake port 12a, and a central portion 80b thereof is sunk into the recessed portion 29 of the rotor 20.

Description

technical field [0001] The present invention relates to a vacuum pump that can be used in a pressure range from low vacuum to ultrahigh vacuum, and to a flexible cover and a rotor for the vacuum pump. Background technique [0002] In the manufacture of semiconductors such as memory or integrated circuits, in order to avoid the influence of dust in the air, it is necessary to dope or etch high-purity semiconductor substrates (wafers) in a high-vacuum chamber, and process gases such as Exhaust with a vacuum pump such as a combination pump combining a turbomolecular pump and a thread groove pump. [0003] As such a vacuum pump, for example, a structure including a cylindrical casing, a cylindrical stator, and a rotor is known. The cylindrical stator is fitted and fixed in the casing and is provided with a screw groove. It is fastened with bolts to the rotor shaft supported so as to be rotatable at high speed in the stator. The process gas is moved upstream of the thread groov...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F04D19/04F04D29/70
CPCF04D19/042F04D19/046F04D29/102F04D29/321F04D29/644F04D19/04F04D29/70F04D29/083F04C25/02F04C2220/10F05B2210/12F16C32/0406
Inventor 川西伸治坂口祐幸三枝健吾
Owner EDWARDS JAPAN
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