An Abrasive Jet Adaptive Dressing Method for Consolidated Abrasive Polishing Pads

A technology of abrasive jet and fixed abrasive, which is applied in grinding/polishing equipment, parts of grinding machine tools, abrasive surface adjustment devices, etc., can solve the problems of poor technical stability and low efficiency, achieve good dressing effect and improve dressing effective, efficient

Active Publication Date: 2020-01-14
HENAN INST OF SCI & TECH
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to solve the problem of poor stability and low efficiency of the existing dressing technology, and to invent an abrasive jet self-adaptive dressing method for a fixed abrasive polishing pad

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • An Abrasive Jet Adaptive Dressing Method for Consolidated Abrasive Polishing Pads
  • An Abrasive Jet Adaptive Dressing Method for Consolidated Abrasive Polishing Pads
  • An Abrasive Jet Adaptive Dressing Method for Consolidated Abrasive Polishing Pads

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0028] Such as Figure 1-3 shown.

[0029] A method for adaptive dressing of abrasive jets for fixed abrasive polishing pads, the process of which is as follows image 3 As shown, the specific steps are as follows:

[0030] First of all, abrasive jet technology and adaptive parameter setting technology are used as polishing pad dressing methods, such as figure 1 shown;

[0031] Secondly, the characteristics of the surface state of the polishing pad at different stages (including the initial stage, the middle stage, and the end stage) are obtained through image feature recognition; image features include color features, image texture features, shape features, and feature point sizes, etc. The characteristics of the surface state of the throwing pad at different processing stages, such as sharp state, passivation state, etc.;

[0032] Third, obtain t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an abrasive jet flow adaptive dressing method for consolidating an abrasive polishing pad. The abrasive jet flow adaptive dressing method for consolidating the abrasive polishing pad is characterized that the abrasive jet flow adaptive dressing method for consolidating the abrasive polishing pad comprises the following steps that firstly, the characteristics of different surface states of the polishing pad, such as a sharp state and a passivation state, are obtained by image recognition; the characteristics of different surface states of the polishing pad are obtained by friction signals; secondly, an artificial neural network is established to obtain the mapping relationship between image and friction characteristics and machining efficiency and quality; and thirdly, on-line measurement of the image, friction signal and feature extraction are carried out in the actual processing, then, according to the processing requirement, self-adaptive judgment is carried out on whether the polishing pad needs to be dressed or not and what kind of dressing parameters are used. The abrasive jet flow adaptive dressing method for consolidating the abrasive polishing pad has high dressing efficiency, can be carried out in time, and can obviously improve the polishing quality.

Description

technical field [0001] The invention relates to a mechanical processing method, especially a finishing polishing technology, in particular to an abrasive jet self-adaptive dressing method for a consolidated abrasive polishing pad. Background technique [0002] The existing dressing technology has certain defects: (1) The dressing effect of the self-dressing technology is poor, and other tools are still needed for dressing in the later stage; (2) The wear of the polishing pad during the dressing of the diamond dresser is large, resulting in a decrease in its service life. Residual debris is difficult to clean, which can block the pores of the polishing pad; (3) The cleaning effect of water jet trimming is good, but part of the "glazed" layer is difficult to remove, and the trimming effect is limited. In addition, the trimming methods adopted by the existing trimming technology are offline trimming or online continuous trimming. Off-line trimming needs to add special processe...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): B24B53/017B24B49/16
CPCB24B49/16B24B53/017
Inventor 王占奎苏建修左敦稳梁明超姚建国马利杰李勇峰刘亚明付素芳
Owner HENAN INST OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap