A kind of X-ray zone plate and preparation method thereof

Abstract

The present invention belongs to the microelectronics and optical technological field and relates to an X-ray zone plate. The X-ray zone plate comprises a supporting body and a thin film loop band structure; the supporting body is the main body supporting of the zone plate; the thickness of the supporting body is the thickness of the zone plate; randomly distributed circular holes are formed in the supporting body; the aperture size of the circular holes is the diameter of the zone plate; the thin film loop band structure includes a thin film material and a second thin film material; the firstthin film material and the second thin film material are alternately deposited on the surfaces of the circular holes; and the value of refractive index difference between the refractive index of thefirst thin film material and the refractive index of the second thin film material can cause a phase difference of pi. The high-aspect ratio zone plate provided by the invention has a bright application prospect in the high-energy ray field. The invention also provides a preparation method of the X-ray zone plate. An atomic layer deposition technology can be adopted to obtain small outermost ringwidth, and control precision can reach a nanometer level.

Description

technical field [0001] The invention relates to the technical fields of microelectronics and optics, in particular to an X-ray zone plate and a preparation method thereof. Background technique [0002] X-rays have a short wavelength and a large penetration depth. They can observe the internal three-dimensional structure of thick materials, and have the potential to image thick samples with nanometer resolution. Fresnel zone plate is the core component of X-ray microscopic imaging technology, and its imaging resolution is determined by the width of the outermost ring. For hard X-rays with high energy, in order to obtain a relatively high diffraction efficiency, the zone plate needs to have sufficient thickness to cause the X-rays to shift the π phase, so it is of great significance to prepare a zone plate with a large aspect ratio. In the past ten years, people have been using the technical route of combining electron beam exposure and X-ray lithography to prepare high-resol...

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Problems solved by technology

[0003] The object of the present invention is to provide an X-ray zone plate and its preparation method to solve the problem that the small outermost ring width and large aspect ratio of the zone plate processed in the prior art cannot be balanced

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