Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

SIW-based dual-frequency slot array antenna

A technology for slot array antennas and antennas, which is applied in directions such as antenna arrays, antennas, and antenna arrays that are energized separately, can solve problems such as large frequency intervals and difficulty breaking through the limitations of application scenarios, and achieve improved stability, large frequency band span, and The effect of bandwidth

Pending Publication Date: 2018-09-18
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
View PDF8 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Although various multi-frequency slot antennas based on SIW have been proposed and researched recently, so far, few designs can achieve large frequency separation, so it is difficult to break through the limitations of application scenarios

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • SIW-based dual-frequency slot array antenna
  • SIW-based dual-frequency slot array antenna
  • SIW-based dual-frequency slot array antenna

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0032] Below in conjunction with specific embodiment and accompanying drawing, technical scheme of the present invention is described in further detail:

[0033] This invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. In the drawings, components are exaggerated for clarity.

[0034] Such as figure 1 , figure 2 , image 3 As shown, the upper and lower dielectric substrates are of the same size, with a thickness of 0.875mm, a length of 55mm, and a width of 33mm. The upper surface of the upper dielectric substrate is printed with metal feeders, and the upper surface of the lower dielectric substrate is a feeding slot and a radiation slot. The surface is covered with copper as the ground of the cavity, and metallized via holes are ad...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an SIW-based dual-frequency slot array antenna. The SIW-based dual-frequency slot array antenna comprises a dual-layer dielectric substrate, wherein a printed metal feeder is arranged on an upper surface of an upper-layer dielectric plate, a feeding slot, a low-frequency radiation slot and a high-frequency radiation slot are etched on an upper surface of a lower-layer dielectric substrate after copper coating, a lower surface is coated with copper, metal via holes are processed in four edges of the lower-layer dielectric plate, the two layers of dielectric plates are assembled and overlapped, the lower-layer dielectric substrate and metal on the upper surface and the lower surface thereof can form an SIW cavity, energy enters the SIW cavity at a lower layer from theprinted metal feeder at an upper layer via the feeding slot, a TE20 mode is formed, radiation of different frequency bands is achieved, low-frequency radiation arrays are arranged at two sides of a central axis of the antenna, a high-frequency radiation array is arranged on the central axis, and the design of the dual-frequency antenna and a relatively good directional diagram radiation effect are achieved. The SIW-based dual-frequency slot array antenna can be simultaneously applied to a microwave band and a millimeter wave band, is high in gain, wide in bandwidth, small in loss and low in profile and is easy to process.

Description

technical field [0001] The invention relates to the technical field of microwave and millimeter wave, in particular to an SIW-based dual-frequency slot array antenna. Background technique [0002] Devices based on SIW structure are widely used in microwave and millimeter wave applications (such as filters, antennas, power dividers, etc.) due to their advantages of easy integration and low loss. The high-order mode can solve the error caused by the increase of frequency Problem; moreover, electromagnetic waves with a frequency greater than the cutoff frequency of the waveguide can propagate in the waveguide. This feature provides the possibility of multi-frequency transmission. The use of multi-band antennas can reduce the number of antennas used in the entire system, thereby improving the stability of the system. ; In addition, the slot antenna has low loss and simple structure, so it is often used in high-speed aircraft. Therefore, antennas with the above characteristics w...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01Q1/38H01Q1/50H01Q5/30H01Q21/06
CPCH01Q1/38H01Q1/50H01Q5/30H01Q21/064Y02D30/70
Inventor 张斯刘少斌唐丹秦江弘史向柱
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com