Multi-cavity horizontal magnetron sputtering film-coating production line and film-coating method thereof

Abstract

The invention belongs to the technical field of film-coating devices, and particularly discloses a multi-cavity horizontal magnetron sputtering film-coating production line. The multi-cavity horizontal magnetron sputtering film-coating production line, in a forward direction of a substrate, successively comprises a feeding platform, a substrate feeding chamber, a heating chamber, a front bufferingchamber, at least two mutually independent magnetron sputtering vacuum film-coating chambers, a rear buffering chamber, a cooling chamber and a discharging platform, and further comprises a transmitting mechanism for transmitting the substrate. The magnetron sputtering film-coating production line is good in film forming effect of magnetron sputtering, high in production efficiency, and high in utilization ratio of a target material, and capable of satisfying the continuous film-coating requirements of a multi-layer functional film, and reducing the using cost of the target material.

Description

technical field [0001] The invention belongs to the technical field of coating production, in particular to a multi-chamber horizontal magnetron sputtering coating production line and a coating method thereof. Background technique [0002] Today, with the increasing development of microelectronics industry and photovoltaic industry technology, vacuum coating technology has played an indispensable role in the development of the above industries. At the same time, the complexity of devices and the requirements for diversification of film layers also have a great impact on the structure and function of vacuum coating equipment. Higher requirements are put forward. In addition to meeting the requirements of the process flow, it is also necessary to be able to achieve continuous industrial production. [0003] At present, the multi-target film coating method in a single vacuum chamber is widely used. Although it can realize the preparation of different film systems, its intermitt...

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Problems solved by technology

[0003] At present, the multi-target film coating method in a single vacuum chamber is widely used. Although it can realize the preparation of different film systems, its intermittent production method limits its continuous production, and there will be gaps between different vacuum sputtering film layers. The phenomenon of pollution, the boundary between different film layers is not very clear, which seriously affects the performance of the coating device; in addition, the existing continuous production line routinely uses the form of planar sputtering targets, and there is a target utilization rate Low, low production efficiency and other disadvantages

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