Positive photosensitive resin composition, display device and pattern forming method thereof
A technology of photosensitive resin and composition, applied in the direction of instruments, optics, optomechanical equipment, etc., can solve the problems of sensitivity, transparency decline, panel productivity and quality decline, circuit width reduction, etc., to achieve excellent sensitivity and excellent resolution rate effect
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Synthetic example 1
[0051] Synthesis Example 1: Preparation of 1,2-quinonediazide compound (A)
[0052] By making 1 mole of 4,4',4"-[cyclohexane-1,1,4-triyl]triphenol (4,4',4"-[cyclohexane-1, 1,4-triyl]triphenol) was condensed with 2.0 moles of 1,2-diazidonaphthoquinone-5-sulfonic acid [chloride] to prepare 4,4',4"-[cyclohexane-1 , 1,4-triyl]triphenol 1,2-diazidonaphthoquinone-5-sulfonate.
[0053] Chemical formula 4:
Synthetic example 2
[0054] Synthesis Example 2: Preparation of 1,2-quinonediazide compound (B)
[0055] By making 1 mole of 4,4',4"-[cyclohexane-1,1,4-triyl]tri[2-methylphenol](4,4',4" represented by the following chemical formula 5 -(cyclohexane-1,1,4-triyl)tris(2-methylphenol)) was condensed with 2.0 moles of 1,2-diazidonaphthoquinone-5-sulfonic acid [chloride] to prepare 4,4 ', 4"-[cyclohexane-1,1,4-triyl]tris[2-methylphenol]1,2-diazidonaphthoquinone-5-sulfonate.
[0056] Chemical formula 5:
Synthetic example 3
[0057] Synthesis Example 3: Preparation of 1,2-quinonediazide compound (C)
[0058] By making 1 mole of 4,4',4"-[cyclohexane-1,1,4-triyl]tri[2,6-dimethylphenol](4,4' represented by the following chemical formula 6 , 4"-(cyclohexane-1,1,4-triyl)tris(2,6-dimethylphenol)) and 2.0 moles of 1,2-diazidonaphthoquinone-5-sulfonic acid [chloride] for condensation reaction To prepare 4,4',4"-[cyclohexane-1,1,4-triyl]tris[2,6-dimethylphenol]1,2-diazidonaphthoquinone-5-sulfonic acid ester.
[0059] Chemical formula 6:
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