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Cleaning method of chip surface

A chip and rinsing time technology, which is applied to liquid cleaning methods, cleaning methods and utensils, chemical instruments and methods, etc., can solve problems such as waste of resources, damage to component patterns, and large impact force of chips, and achieve good cleaning effect. The effect of extending the service life and improving the surface cleanliness

Inactive Publication Date: 2018-10-09
SAE TECH DELEVOPMENT DONGGUAN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this cleaning method has too much impact on the chip, which is likely to cause damage to the component pattern, and the utilization rate of deionized water in this cleaning method is low, resulting in waste of resources
Another cleaning method is to use hydrochloric acid or hydrofluoric acid for immersion cleaning, however, the cleaning effect of this cleaning method is not good, and the residual solution on the surface will cause corrosion on the chip surface

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016] The method for cleaning the chip surface of the present invention will be further described below in conjunction with the examples, but the present invention is not limited thereto.

[0017] One embodiment of the cleaning method of the chip surface of the present invention comprises the following steps in turn:

[0018] The chip is placed in an alkaline solution and cleaned by ultrasonic waves;

[0019] The chip is cleaned by ultrasonic waves in a mixture of isopropanol and water;

[0020] The chip is placed in a citric acid solution and cleaned by ultrasonic waves; and

[0021] The chip was rinsed with deionized water.

[0022] The cleaning method of the chip surface of the present invention adopts alkaline solution, the mixed solution of isopropanol and water, citric acid solution and deionized water to clean successively, and adopts ultrasonic cleaning technology in the cleaning process, and can be Effectively remove residues and damaged layers, the cleaning effec...

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PUM

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Abstract

The invention discloses the cleaning method of a chip surface. The method successively comprises placing a chip in an alkaline solution and using an ultrasonic wave to clean; placing the chip in the mixed liquor of isopropanol and water and using the ultrasonic wave to clean; placing the chip in a citric acid solution and using the ultrasonic wave to clean; and using deionized water to rinse the chip. By using the method, residues on a chip surface can be high-efficiently removed and the chip can be prevented from being corroded so that the service life of the chip is prolonged.

Description

technical field [0001] The invention relates to the field of semiconductor chip cleaning, in particular to a chip surface cleaning method. Background technique [0002] As the feature size of integrated circuits enters the deep submicron stage, the cleanliness of the chip surface required in the integrated circuit chip manufacturing process is getting higher and higher. In order to ensure the cleanliness of the chip material surface, there are hundreds of road cleaning process. [0003] The traditional cleaning method is to use deionized water to rinse the chip. In this method, the deionized water hits the chip with a high flow rate to wash away the impurities and pollutants on the chip, so as to achieve the cleaning effect. However, this cleaning method has too much impact on the chip, which may easily cause damage to the element pattern, and the utilization rate of deionized water in this cleaning method is low, resulting in waste of resources. Another cleaning method is...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/02B08B3/04B08B3/08B08B3/12
CPCB08B3/04B08B3/08B08B3/12H01L21/02057
Inventor 何小麟
Owner SAE TECH DELEVOPMENT DONGGUAN