A kind of graphene doping preparation and repair method
A repair method, graphene technology, applied in the field of graphene doping preparation and repair, can solve the problems of incomplete plane size, surface attachment impurities, low reaction temperature, etc., achieve smooth surface, wide range of applicable substrates, doping reaction The effect of low temperature
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[0037] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.
[0038] see figure 1, the present invention provides a technical solution: a graphene-doped preparation and repair method, the steps of the graphene-doped preparation and repair method are as follows:
[0039] S01: first grow a graphene film on a specific substrate by CVD;
[0040] S02: Transfer the graphene film to the required substrate surface, and use oxygen plasma to etch the graphene to obtain the desired shape;
[0041] S03: Then use the MPCVD method to do N-type or P-type element doping on the graphene and repair it.
[0042] As a preferred embodiment of the present invention, the specific substrate can be any one of copper foil, nickel foil, gold foil, tita...
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