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Common-stator large-stroke cross-scale three-degree-of-freedom parallel motion platform

A motion platform and large-stroke technology, applied in the field of motion platforms, can solve problems such as motion error accumulation, difficulty in achieving nanometer precision, and short strokes, and achieve good preload effects, high acceleration, and vibration suppression effects

Pending Publication Date: 2018-11-06
GUANGDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Domestic utility model patent CN20132009404.X discloses a coaxial macro-micro compound linear motion platform device and its precision compensation method. The device can realize real-time detection of platform displacement information to achieve high static and dynamic precision of the platform. However, due to its It is difficult for traditional flexible mechanisms to achieve nanometer precision
[0004] In the fields of traditional precision machining and precision measurement, the motion platform is mostly a simple superposition of several single-axis platforms, with many joint links and motion components, and serious accumulation of motion errors. Most of them are difficult to satisfy multiple degrees of freedom and high precision at the same time. , in addition, the stroke of the platform that realizes high-precision motion control is generally short, and the precision of the feed platform that realizes large stroke cannot meet the actual demand

Method used

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  • Common-stator large-stroke cross-scale three-degree-of-freedom parallel motion platform
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  • Common-stator large-stroke cross-scale three-degree-of-freedom parallel motion platform

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Embodiment Construction

[0030] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0031] It should be noted that the terms “front”, “rear”, “left” and “right” used in the definitions of structures in this application only represent a relative positional relationship between structures and do not limit the structure itself. .

[0032] Such as Figure 1-3 As shown, a specific embodiment of the present invention provides a three-degree-of-freedom parallel motion platform with a large stroke and a common stator. The motion platform includes a ...

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Abstract

The invention provides a common-stator large-stroke cross-scale three-degree-of-freedom parallel motion platform. The motion platform comprises a base, a working platform, a Y-axis motion system and aZ-axis motion suspension beam assembly; the working platform is arranged on the Z-axis motion suspension beam assembly; and the Z-axis motion suspension beam assembly is arranged on a middle macro-moving component. According to the motion platform, the whole macro-micro motion only needs one motor stator, three electric motors, driving sources of two piezoelectric ceramics to move coordinately, so that any combination of and macro-micro switching of the three-degree-of-freedom can be achieved; and each motion component adopts a macro micro common rail mode, a left macro-moving component, themiddle macro-moving component and a right macro-moving component move upwards, a driving structure on the single side is a design structure of a single motor and a common stator, the large-stroke motion can be realized, meanwhile, the high-speed and high-acceleration speed are achieved, and the motion platform realizes horizontal pitching motion.

Description

technical field [0001] The invention relates to the technical field of motion platforms, in particular to a common-stator large-stroke cross-scale three-degree-of-freedom parallel motion platform. Background technique [0002] With the development of science, many application fields such as semiconductor lithography, IC circuit manufacturing and packaging, biomedicine, precision numerical control processing, integrated circuit manufacturing, etc. have put forward higher requirements for precision positioning technology, which requires large travel and high precision. , quick response and so on. However, large stroke and high precision are always a pair of contradictions. It is very important to coordinate the relationship between the two. In practice, one aspect is often sacrificed to achieve high performance on the other. At present, achieving precise positioning while achieving large-stroke motion has become one of the prerequisites and key technologies that urgently need...

Claims

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Application Information

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IPC IPC(8): B23Q1/25B23Q5/28B25H1/14H02N2/02
CPCH02N2/02B23Q1/25B23Q5/28B25H1/14Y02P70/10
Inventor 高健张金迪张揽宇钟永彬刘亚超陈新谭令威钟耿君万宇
Owner GUANGDONG UNIV OF TECH
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