Encapsulation method of three-dimensional heterogeneous structure to realize high-power gan device layer heat dissipation
A technology of heterogeneous structure and packaging method, which is applied in semiconductor devices, electric solid devices, semiconductor/solid device manufacturing, etc., can solve the problem of low thermal diffusivity and insufficient heat dissipation capacity to meet the heat flux density of high-power GaN chip three-dimensional integrated packaging, unfavorable High density, miniaturized three-dimensional integrated packaging and other issues, to achieve high manufacturability, efficient heat dissipation efficiency, and high stability
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[0044] A packaging structure of a three-dimensional heterogeneous structure that realizes heat dissipation of high-power GaN device layers, such as Figure 4-6 shown, including:
[0045] The first substrate 110, the first substrate 110 made of a high-resistance silicon material (≥1000Ω·cm) substrate is composed of a first substrate 111 and a second substrate 112, and the first substrate 110 has a front surface 000 and A back surface 001, the first substrate 110 includes a certain depth of first vertical micro-channels 113 and vertical interconnection structures. The front 000 of the first substrate 110 is provided with a microchannel output port 114 corresponding to the size of the embedded microchannel structure, and the back 001 is provided with a microchannel input port 115 corresponding to the size of the embedded microchannel structure 113; The vertical interconnection structure is formed by the following structure: the first substrate 110 is provided with a plurality of...
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