Photosensitive resin composition
A technology of photosensitive resin and composition, which is applied in the field of photosensitive resin composition, and can solve problems such as improved adhesion, defective components, and poor adhesion of substrates
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preparation example 1
[0082] Preparation Example 1: Preparation of Acrylic Copolymer (Mw: 6000)
[0083] A mixed solution of 400 parts by weight of tetrahydrofuran, 30 parts by weight of methacrylic acid, 30 parts by weight of styrene, and 40 parts by weight of glycidyl methacrylate was placed in a flask equipped with a condenser and a stirrer. After the liquid composition was thoroughly mixed in a mixing vessel at 600 rpm, 15 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) was added. Slowly raise the temperature of the polymerization mixed solution to 55° C., keep at this temperature for 24 hours, then cool to normal temperature, and add 500 ppm of hydrogenated benzophenone (hydrobenzophenone) as a polymerization inhibitor to obtain a solid concentration of 30 wt. % polymer solution.
[0084]In order to remove unreacted monomers in the polymer solution, 100 parts by weight of the polymer solution were precipitated with respect to 1000 parts by weight of n-Hexane. After the precipitatio...
preparation example 2
[0086] Preparation Example 2: Preparation of Acrylic Copolymer (Mw: 1500)
[0087] Except for using 28 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile), an acrylic copolymer with a weight average molecular weight of 1500 was prepared by the same method as in Preparation Example 1 .
preparation example 3
[0088] Preparation Example 3: Preparation of Acrylic Copolymer (Mw: 3000)
[0089] Except for using 21 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile), an acrylic copolymer with a weight average molecular weight of 3000 was prepared by the same method as in Preparation Example 1 .
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