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Measuring method for thermal contraction of electronic glass for high resolution display

A measurement method and display technology, applied in the direction of material thermal expansion coefficient, etc., can solve the problems of low precision and large measurement error, and achieve the effect of improving precision, high accuracy and good reproducibility

Inactive Publication Date: 2019-01-11
IRICO DISPLAY DEVICES
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The purpose of the present invention is to provide a method for measuring heat shrinkage of electronic glass for high-resolution display, which solves the defects of large measurement error and low precision in the existing method for measuring heat shrinkage of electronic glass

Method used

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  • Measuring method for thermal contraction of electronic glass for high resolution display
  • Measuring method for thermal contraction of electronic glass for high resolution display
  • Measuring method for thermal contraction of electronic glass for high resolution display

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Embodiment

[0040] The invention provides a method for measuring thermal shrinkage rate of electronic glass for high-resolution display, the method comprising the following steps:

[0041] Step (1): Take the glass sample to be tested, and use a Vickers hardness tester to make two diamond-shaped marks on the two sides of the sample to be tested in the length direction, which are marked as A and B;

[0042] Step (2): Use an optical microscope to measure the distance L0 between A and B;

[0043] Step (3): Put the sample into the grid tray, then put the tray into the small grid space of the heating device, heat the sample to 550°C and 600°C at a heating rate of 5-10°C / min, and keep it warm for 10 After ~120°C, cool down to room temperature at a cooling rate of 10-600°C / min, then take out the tray from the heating device and place it in a constant room temperature environment;

[0044] Step (4): using an optical microscope to measure the distance L between A and B;

[0045] Step (5): Calcula...

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Abstract

The invention provides a measuring method for thermal contraction of electronic glass for high resolution display. The measuring method comprises the following steps: 1) taking a to-be-measured glasssample, carving two shape marks on the to-be-measured glass sample along the length direction and respectively marking as A and B; 2) measuring a distance between the mark A and the mark B, thereby acquiring the distance L0 before heat treatment; 3) putting the to-be-measured glass sample with the marks acquired in the step 1) into a heating device for heating; 4) measuring the distance between the mark A and the mark B after heat treatment, thereby acquiring the distance L; 5) calculating a thermal contraction rate a of the to-be-measured glass sample according to the acquired distance L0 anddistance L. According to the measuring method provided by the invention, the problem of big measuring error caused by the marking depth difference introduced by the marking of abrasive paper or glasscutter or the influence of load on length in the measuring process with a dilatometer can be solved, the measurement accuracy is promoted, the repeatability is excellent and a data reference can be more effectively provided to the manufacturing technique of display devices.

Description

technical field [0001] The invention belongs to the technical field of glass measurement, and in particular relates to a method for measuring heat shrinkage of electronic glass for high-resolution display. Background technique [0002] With the continuous development of display technology, people are increasingly pursuing high-resolution and high-quality images, and have higher requirements for the size and response time of TFTs. Due to its high electron mobility (1,000 times higher than amorphous silicon technology), LTPS technology allows the manufacture of driver ICs and other electronic devices on glass substrates, reducing device costs, simplifying the later module process, and improving yield. rate, thus becoming the current mainstream TFT manufacturing technology. [0003] The LTPS process generally uses laser annealing technology to crystallize the amorphous silicon layer. The most efficient polysilicon (p-Si) processing method is operated at a temperature above 600...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N25/16
CPCG01N25/16
Inventor 曾召郭萍莉刘晓芳孔令歆
Owner IRICO DISPLAY DEVICES
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