Interconnected grid line and manufacturing method, applicable solar cell and interconnect mode
A technology of solar cells and solar cells, which is applied in circuits, photovoltaic power generation, electrical components, etc., can solve problems such as high cost, short circuit of cells, and reduction of battery output power, so as to save costs, reduce series resistance, and improve battery performance Effect
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[0032] Example 1
[0033] like figure 1 As shown in a, the left side is the schematic diagram of the cell, and the right side is the schematic diagram of the electroplating grid line structure after the interconnection area is enlarged.
[0034] In this embodiment, the electroplating grid line includes a metal grid wire frame 130 fabricated in the region where the solar cell sheets 110 are interconnected at the long edge border of the solar cell sheet 110 . It includes a main frame 131 parallel to the long side of the battery and connected to one end of the metal sub-grid electrode 120 on the battery, two horizontal sub-frames 132 and a vertical sub-frame 133 . The main frame 131 has a height of about 2-20 μm, preferably 5-12 μm, and a width of 12-300 μm, preferably 80-300 μm. The height of the three sub-frames 132 and 133 is about 2-20 μm, preferably 5-12 μm, and the width is 12-300 μm, preferably 12-45 μm here. The length of the lateral sub-frame 132 is about 0.5-3 mm, p...
Example Embodiment
[0038] Example 2
[0039] like figure 2 As shown, the left side is a schematic diagram of the cell, and the right side is a schematic diagram of the electroplating grid line structure after the interconnection area is enlarged.
[0040] In this embodiment, the electroplating grid line includes a metal grid line frame 230 fabricated in the region where the solar cell sheets 210 are interconnected at the long side boundary of the solar cell sheet 210 .
[0041] In this embodiment, the main frame 231 and the secondary frame 232 have the same width, preferably 80-200 μm, and the frame height is about 2-20 μm, preferably 5-12 μm. The length of the lateral sub-frame 132 is about 0.5-3 mm, preferably about 1 mm. The beneficial effect of adopting a wider sub-frame is that charge transfer is carried out through the surrounding frame, not only through the main frame and the conductive adhesive, the series resistance is reduced, and the metal grid wire frame 230 still has a better fun...
Example Embodiment
[0044] Example 3
[0045] like image 3 As shown, the left side is a schematic diagram of the cell, and the right side is a schematic diagram of the electroplating grid line structure after the interconnection area is enlarged.
[0046] In this embodiment, the electroplating grid line includes a metal grid line frame 330 fabricated in the region where the solar cell sheets 310 are interconnected at the long side boundary of the solar cell sheet 310 .
[0047] In this embodiment, the width of the sub-frame 332 is 12-300 μm, preferably 12-45 μm, and the height is about 2-20 μm, preferably 5-12 μm. The main frame 331 is a grid-shaped fine grid, and the width of each thin grid line is preferably about 15-45 μm. Using the grid-like fine grid as the main frame 331 can reduce the maximum width of the plated grid lines and ensure that the plated grid lines have sufficient adhesion.
[0048] In this embodiment, the metal grid wire frame 330 also has a pattern structure metal layer 3...
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