Amorphous silicon/crystalline silicon heterojunction solar cell and preparation method thereof
A solar cell and amorphous silicon technology, which is applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems affecting the service life, economic benefits, and attenuation of amorphous silicon/crystalline silicon heterojunction solar cells, so as to improve the photovoltaic power generation. Conversion efficiency, improved stability, optimized effect of anti-reflection effect
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[0059] There are many existing methods for preparing the transparent conductive oxide film 105, and preparing the transparent conductive oxide film 105 with low temperature and low damage is the key to obtain the high-efficiency amorphous silicon / crystalline silicon heterojunction solar cell . At present, magnetron sputtering (Sputtering) coating technology and reactive plasma deposition (RPD) technology are two alternative technologies for commercial preparation of the transparent conductive oxide film 105. As mentioned above, since the transparent conductive oxide film 105 serves as both a conductive layer and an anti-reflection layer, it is required to cover the surface of the amorphous silicon as much as possible in terms of structural design, so as to give full play to its conductivity and The dual function of anti-reflection. However, since the N-type monocrystalline silicon wafer 101 is relatively thin (100 μm ~ 200 μm), the transparent conductive oxide film 105 is easi...
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[0065] Example one
[0066] Such as figure 2 , The present invention provides a method for preparing an amorphous silicon / crystalline silicon heterojunction solar cell, which includes the following steps:
[0067] Preparing an amorphous silicon / crystalline silicon heterojunction structure, wherein the upper surface and the lower surface of the amorphous silicon / crystalline silicon heterojunction structure respectively include a central area and an edge area surrounding the central area;
[0068] A transparent conductive oxide film is prepared, the transparent conductive oxide film covers the central region of the amorphous silicon / crystalline silicon heterojunction structure, and the transparent conductive oxide film is at least exposed in the amorphous silicon / The edge region on one of the upper surface and the lower surface of the crystalline silicon heterojunction structure;
[0069] Forming a metal electrode on the transparent conductive oxide film;
[0070] A cover film is forme...
Example Embodiment
[0088] Example two
[0089] Figure 6a~Figure 6b , The present invention also provides an amorphous silicon / crystalline silicon heterojunction solar cell, the amorphous silicon / crystalline silicon heterojunction solar cell includes:
[0090] Amorphous silicon / crystalline silicon heterojunction structure 100, the upper surface and lower surface of the amorphous silicon / crystalline silicon heterojunction structure 100 respectively include a central area A and an edge area B surrounding the central area A;
[0091] A transparent conductive oxide film 200, the transparent conductive oxide film 200 covers the central area A of the amorphous silicon / crystalline silicon heterojunction structure 100, and the transparent conductive oxide film 200 is at least exposed in the The edge region B on one of the upper surface and the lower surface of the amorphous silicon / crystalline silicon heterojunction structure 100;
[0092] The metal electrode 300 is located on the transparent conductive oxide f...
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