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hhg source, inspection device and method for performing measurements

A technology for inspecting equipment and radiation sources, applied in measuring devices, optomechanical equipment, microlithography exposure equipment, etc., can solve problems such as increased thickness and increased product structure complexity

Active Publication Date: 2021-05-25
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, the complexity of the product structure is increasing, the product structure includes the increased number of layers and the corresponding increase in thickness

Method used

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  • hhg source, inspection device and method for performing measurements
  • hhg source, inspection device and method for performing measurements
  • hhg source, inspection device and method for performing measurements

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Embodiment Construction

[0028] Before describing embodiments of the invention in detail, it is instructive to provide an example environment in which embodiments of the invention may be implemented.

[0029] figure 1 A lithographic apparatus LA is shown at 200 as part of an industrial facility implementing a high volume lithographic fabrication process. In this example, the fabrication process is adapted to fabricate semiconductor products (integrated circuits) on substrates such as semiconductor wafers. Those skilled in the art will recognize that a wide variety of products can be fabricated by processing different types of substrates in variations of this process. Production using semiconductor products is purely as an example of great commercial significance today.

[0030] Within a lithographic apparatus (or simply "lithographic tool" 200 ), a measurement station MEA is shown at 202 and an exposure station EXP is shown at 204 . At 206 a control unit LACU is shown. In this example, each subst...

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PUM

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Abstract

A method of performing measurements in an inspection device, and associated inspection device and HHG source are disclosed. The method includes configuring one or more controllable characteristics of at least one drive laser pulse of a harmonic generating radiation source to control the output emission spectrum of illumination radiation provided by the harmonic generating radiation source; and utilizing said irradiation radiation to illuminate the target structure. The method can include configuring the drive laser pulse such that the output emission spectrum includes a plurality of discrete harmonic peaks. Alternatively, the method may comprise using multiple drive laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from EP application 16167512.9 filed on April 28, 2016, the entire content of which is hereby incorporated by reference. technical field [0003] The invention relates to a HHG source, an inspection device and a method for performing measurements. In particular, the invention relates to an inspection apparatus included in a lithographic apparatus and a method for performing measurements using the inspection apparatus Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment can be used to fabricate integrated circuits (ICs). In this case, a patterning device (alternatively called a mask or reticle) may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, a ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G01N21/95H01S3/109
CPCG01N21/9501G03F7/70625G03F7/70633G01N21/956G01N2021/8845G02F1/3551G02F1/37G03F7/70616H01S3/1305H01S3/1625G01B11/24H01S3/1636G03F7/70141H01S3/0092
Inventor 林楠A·J·登博夫S·B·鲁博尔S·G·J·马斯杰森N·盖佩恩
Owner ASML NETHERLANDS BV