Image quality compensation device and method

Abstract

The invention discloses an image quality compensation device and method. The device comprises an objective lens unit, an image quality compensation unit and an image quality detection unit used for detecting the image quality of the objective lens unit, wherein the image quality compensation unit comprises a film reflection module arranged in the light path of the objective lens unit, and a deformation control module independently connected with the image quality detection unit and the film reflection module. According to the image quality data, which is detected by the image quality detectionunit, of the objective lens unit, the regulation amounts of different positions on the film reflection module can be obtained, and the deformation control module carries out vertical direction regulation according to the regulation amounts of different positions on the film reflection module to obtain a required face type. By use of the device, the constant terms, which are distributed along a field of view, of all large-range aberrations can be accurately compensated, and in addition, the problems of low regulation accuracy, inaccurate regulation amounts and the like since large external force is required for generating the required face type for a lens with large thickness when image quality compensation is carried out in a traditional active deformation mechanism are completely avoided.

Description

technical field [0001] The invention relates to the field of photolithography technology, and in particular to an image quality compensation device and method. Background technique [0002] In semiconductor packaging technology, lithography objective lenses used to manufacture integrated circuit chips usually have high resolution and large depth of focus to achieve the preparation of highly integrated chips. At the same time, it is also required that the optical imaging system used for projection exposure has a good image quality compensation capability to meet the image quality requirements of the exposure area during chip preparation. With the continuous improvement of lithographic imaging technology, while the feature size of the chip is continuously shrinking, the requirements for aberrations generated in the optical system are more stringent. Therefore, improving the image quality of the optical imaging system is a key factor for preparing chips with good overall perfo...

AI Technical Summary

Problems solved by technology

[0010] The present invention provides an image quality compensation device and method to solve the problems in the prior art that the compensation ability for asymmetric aberrations is poor, the compensable items are relatively limited, and all aberrations cannot be compensated

Images