Differential multi-bit through silicon via structure and preparation method thereof
A multi-bit, through-silicon via technology, applied in the field of three-dimensional integration, can solve the problem of occupying a large chip area, achieve the effects of improving utilization, suppressing common mode noise and electromagnetic interference, and improving transmission quality
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[0043] The present invention will be further described below in conjunction with the drawings.
[0044] Such as figure 1 , figure 2 , image 3 , Figure 4 As shown, a differential multi-bit through silicon via structure includes a silicon substrate, a first dielectric layer, a first reference line, a second dielectric layer, a carbon nanotube bundle, a third dielectric layer, a second reference line, and a first metal Pads, second metal pads, third metal pads, and fourth metal pads; the silicon substrate 110 is provided with a first reference line 101 and a second reference line 105 that are spaced apart and are cylindrical; the first reference The line 101 is provided with a cylindrical first dielectric layer 100, and the second reference line 105 is provided with a cylindrical third dielectric layer 104; the material of the first reference line 101 and the second reference line 105 is copper, As the return path of the current; the material of the first dielectric layer 100 and...
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