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Patterned quantum dot color film, preparation method thereof, and display device

A quantum dot and patterning technology, which is applied to the exposure device of photoengraving process, photoengraving process of pattern surface, optical mechanical equipment, etc., can solve the problems of complex process, excitation of green quantum dot filter, etc. Pure, simple and efficient preparation method, the effect of improving brightness and color gamut

Inactive Publication Date: 2019-03-15
BEIJING SINEVA TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method is complex and requires hydrophobic treatment of the organic photoresist layer; in addition, the green sub-pixels are transmitted by blue light, and the red sub-pixels cannot be effectively excited by the underlying green quantum dot filter.

Method used

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  • Patterned quantum dot color film, preparation method thereof, and display device
  • Patterned quantum dot color film, preparation method thereof, and display device
  • Patterned quantum dot color film, preparation method thereof, and display device

Examples

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preparation example Construction

[0055] figure 2 The preparation method of the above-mentioned patterned quantum dot color film is provided, comprising the steps of:

[0056] S101: Provide a transparent substrate, and form a red organic photoresist layer, a green organic photoresist layer and a blue organic photoresist layer on the transparent substrate;

[0057] S102: Depositing a red quantum dot photoresist layer on the red organic photoresist layer to obtain the red sub-pixel part of the patterned quantum dot color film; depositing a green quantum dot photoresist layer on the green organic photoresist layer , to obtain the green sub-pixel part of the patterned quantum dot color film.

[0058] In S101 , a red organic photoresist layer, a green organic photoresist layer and a blue organic photoresist layer are formed on the transparent substrate by using an organic color photoresist material through a photolithography process.

[0059] In the preparation method of the present invention, by coating the qua...

Embodiment 1

[0080] Provide a transparent substrate through photolithography, and form a black matrix on the transparent substrate through a photolithography process to separate the red sub-pixel part, the green sub-pixel part and the blue sub-pixel part;

[0081] Through a photolithography process, a red organic photoresist layer, a green organic photoresist layer and a blue organic photoresist layer are formed on a transparent substrate formed with a black matrix; wherein, the red organic photoresist layer, the green organic photoresist layer The thickness of the resist layer is 1 μm, and the thickness of the blue organic photoresist layer is 6 μm;

[0082] Deposit a red quantum dot photoresist layer on the red organic photoresist layer through a photolithography process to obtain the red sub-pixel part of the patterned quantum dot color film; through a photolithography process, deposit a green photoresist layer on a green organic photoresist layer The quantum dot photoresist layer is us...

Embodiment 2

[0084] Deposit a red quantum dot photoresist layer on a red organic photoresist layer by an inkjet printing process, and deposit a green quantum dot photoresist layer on a green organic photoresist layer by an inkjet printing process, and others are the same as in Example 1 same.

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Abstract

The invention relates to the technical field of display, and particularly relates to a patterned quantum dot color film, a preparation method thereof, and a display device. The patterned quantum dot color film provided by the invention comprises a transparent substrate, an organic color photoresist layer and a quantum dot photoresist layer, wherein the organic color photoresist layer and the quantum dot photoresist layer are arranged on the transparent substrate.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a patterned quantum dot color film, a preparation method thereof, and a display device. Background technique [0002] Quantum dots are nanoparticles composed of II-VI or III-V elements. The particle size of quantum dots is generally between 1-10nm. Since electrons and holes are quantum-confined, the continuous energy band structure becomes a separated energy level structure, which can emit fluorescence after being excited. [0003] As a novel semiconductor nanomaterial, quantum dots have many unique nanoscale properties, and their main optical properties include broad absorption peak, narrow emission peak, fluorescence efficiency, and tunable emission wavelength. Among them, the most important feature is that quantum dot materials of different materials and sizes can emit light of a specific color after being stimulated by light or electricity. Utilizing the unique nanometer c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/095G03F7/20
CPCG03F7/095G03F7/2008G03F7/70191
Inventor 岳爽李琳梁珂
Owner BEIJING SINEVA TECH
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