Preparation method and device for photoresist microstructure of large-aperture thin film diffraction lens
A diffractive lens and photoresist technology, which is applied in microlithography exposure equipment, patterned surface photoengraving process, opto-mechanical equipment, etc. , to achieve the effect of high-resolution optical imaging
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[0031] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.
[0032] The present invention takes the preparation of the photoresist microstructure of the polyimide film diffractive lens with a diameter of 400 mm as an example, combined with the schematic diagram of the preparation method of the photoresist microstructure of the large-diameter film diffractive lens figure 1 of figure 1 a- figure 1 f, The principle and process steps of the preparation method of the photoresist microstructure of the large-aperture thin-film diffractive lens in detail. in, figure 1 a is a schematic diagram of the coating process steps of the method for preparing the photoresist microstructure of the large-aperture thin-film diffractive lens; figure 1 b is a schematic diagram of the datum plane leveling process steps of the method for preparing the photoresist microstructure of the large-aperture thin film diffractive len...
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