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Design method of thin film diffraction element and thin film diffraction element

A technology of diffractive elements and design methods, applied in the directions of diffraction gratings, optical elements, instruments, etc., can solve the problems of high cost, difficult processing, high price, etc., to reduce quality, reduce size and quality restrictions, and promote lightness and thinning. Portable effect

Active Publication Date: 2020-05-19
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

Apochromatic aberration refers to the elimination of chromatic aberration by the three characteristic wavelengths of F light (486.1nm), e light (wavelength 527.0nm) and C light (wavelength 656.3nm), and apochromatic aberration requires some special optical properties. Materials, such as fluorite and fluorine crown glasses, which are expensive, difficult to process, and very expensive

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  • Design method of thin film diffraction element and thin film diffraction element
  • Design method of thin film diffraction element and thin film diffraction element
  • Design method of thin film diffraction element and thin film diffraction element

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Embodiment Construction

[0024] In the following description, specific details such as specific system structures and technologies are presented for the purpose of illustration rather than limitation, so as to thoroughly understand the embodiments of the present application. It will be apparent, however, to one skilled in the art that the present application may be practiced in other embodiments without these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present application with unnecessary detail.

[0025] figure 1 The design method of the thin film diffraction element provided by the application is shown, and the details are as follows: the design method includes:

[0026] Step S11, obtaining the basic parameters of the thin film diffraction element, wherein the thin film diffraction element is a broadband diffraction element, and the basic parameters include the central desig...

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Abstract

The present application relates to a design method of a thin-film diffraction element and the thin-film diffraction element, including: acquiring basic parameters of the thin-film diffraction element, wherein the thin-film diffraction element is a broadband diffraction element, and the basic parameters include the parameters of the thin-film diffraction element The central design wavelength, bandwidth, wavelength sampling interval, step width and step cycle number; calculate the step height corresponding to each sampling wavelength according to the basic parameters; perform simulation experiment demonstration according to the step height to obtain the thin film diffraction element. The application of the apochromatic diffraction element of the present invention can greatly reduce the quality of the optical system, thereby reducing the size and quality constraints of the space vehicle on the space-based telescopic system; compressing the space of the optical system in the axial direction, and promoting intelligent equipment Further slimming and portability.

Description

technical field [0001] The present application relates to the technical field of optical elements, in particular to a design method of a thin film diffraction element and the thin film diffraction element. Background technique [0002] In recent years, people have put forward higher and higher requirements for space observation accuracy and observation range, and the aperture of telescopes has also increased accordingly. This is due to the fact that the larger the aperture of the telescope, the higher the resolution of the system. The energy collection capability of the telescopic system is proportional to the square of the caliber, so in order to meet people's needs for the range and accuracy of deep space detection, the caliber of the telescopic system often needs to be designed very large, but it is limited by the load of the carrier platform and other High transportation costs often require compromises in the design and performance of the telephoto system. [0003] As ...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G02B27/00
CPCG02B5/1857G02B27/0012
Inventor 王孝坤张海东薛栋林张学军
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI