Method for manufacturing transparent flexible capacitor with high quality factor

Abstract

The invention provides a method for manufacturing a transparent flexible capacitor with a high quality factor. Specific steps include: (1) transferring a PS ball on a plastic flexible substrate; (2) performing retraction ball treatment on a PS ball template obtained in the step (1) by using a reactive ion beam etching technique; (3) depositing metal on the PS ball template in the step (2) by a thermal evaporation process; (4) removing the PS ball template in the step (3), leaving a metal nano-net as a bottom electrode of the transparent flexible capacitor; (5) growing a high-k dielectric material as a dielectric layer on the metal nano-mesh electrode prepared in the step (4); (6) repeating the above steps (1-4), and making the metal nano-net on the dielectric layer as a top electrode of the capacitor; (7) performing photolithography and wet etching on the top electrode, to obtain a transparent flexible capacitor device. The capacitor prepared by the method has good performance in flexibility and transparency, and can be used for transparent flexible electronic devices.

Description

Technical field [0001] The invention belongs to the technical field of transparent flexible capacitors, and specifically relates to a method for preparing a transparent flexible capacitor with a high quality factor. Background technique [0002] Transparent flexible capacitors have a wide range of applications. For example, in the field of transparent flexible displays, as a basic element for charging and discharging in the driving circuit of liquid crystal displays (LCD) and organic light emitting diodes (OLED); in wearable thin film solar cells , As the energy storage element of the transparent window; in the transparent flexible digital integrated circuit, as the basic logic element and so on. But when these devices achieve transparency and flexibility, higher requirements are put forward for the service life, transparency and flexibility of the basic element capacitor. The higher the quality factor of the capacitor (the smaller the loss), the longer its service life. Among ...

AI Technical Summary

Problems solved by technology

However, due to the lack of dangling bonds on its surface, it is impossible to deposit a high-quality high-K dielectric film on its surface by atomic layer deposition technology, which will lead to a large leakage current of the capacitor, which is also not conducive to the preparation of transparent flexible capacitors with high quality factors.

The composite electrode based on silver nanowires usually has a sheet resistance of less than 100 ohms, but the introduction of silver nanowires will seriously reduce the transparency of the electrode.

Therefore, transparent flexible capacitors prepared based on the above electrodes cannot simultaneously reduce electrode loss and dielectric layer loss to achieve a longer service life of the capacitor.

At present, there is no report on how to obtain electrodes with extremely low sheet resistance and good light transmittance to prepare transparent flexible capacitors with high quality factor.

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