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Full-automatic furnace chamber lifting and rotating system

A lifter and furnace body technology, applied in the direction of self-melting liquid pulling method, crystal growth, single crystal growth, etc., can solve the problems of slow startup, oil leakage of hydraulic system will pollute the environment, oil leakage is easy to burn, etc., and achieve equipment operation. smooth effect

Pending Publication Date: 2019-06-04
ZHEJIANG JINGSHENG MECHANICAL & ELECTRICAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although a certain degree of automation has been achieved, in order to realize this method, there is an oil leakage in the hydraulic system that will pollute the environment. Semiconductor equipment has strict requirements on the environment, and oil leakage is easy to burn at high temperatures, posing a safety hazard.
The existing equipment does not have the main chamber rotation function, and the rotation system driven by the sprocket has problems such as slow start and rotation accuracy

Method used

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  • Full-automatic furnace chamber lifting and rotating system
  • Full-automatic furnace chamber lifting and rotating system

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Embodiment Construction

[0022] In order to enable those skilled in the art to better understand the solution of the present invention, the present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments:

[0023] Please refer to the accompanying drawings, which are structural schematic diagrams of the fully automatic furnace lifting and lowering rotation system provided by the embodiment of the present invention.

[0024] A fully automatic furnace lifting and rotating mechanism, including a column body 11, a rotating mechanism 5, a lifting mechanism and a bracket assembly.

[0025] The side wall of the column body 11 is provided with an upper support base 1 , an elevator support 9 and a lower support base 10 linearly from top to bottom. The elevator support 9 is provided with an elevator assembly driven by a servo motor.

[0026] The lifting mechanism includes a screw mandrel 7, and the lower end of the screw mandrel 7 is connected w...

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Abstract

The invention relates to the field of monocrystalline silicon preparation equipment, in particular to a full-automatic furnace chamber lifting and rotating system. The full-automatic furnace chamber lifting and rotating system comprises a vertical column body. An upper supporting seat, a lifter supporting seat and a lower supporting seat are sequentially linearly arranged on the side wall of the vertical column body from top to bottom, a lifter assembly driven by a servo motor is arranged in the lifter supporting seat, a lifting mechanism comprises a screw rod, and the lower end of the screw rod is connected with the lifter assembly; the middle of the screw rod is connected with a lifting plate through a nut, a screw rod top seat is arranged at the top end of the screw rod, and the screw rod top seat is fixedly arranged on the vertical column body; one end of a lifting block is connected with a furnace body, the other end of the lifting block is connected with a supporting frame through an adjusting bracket, and the supporting frame is fixedly arranged on the side part of a lifting bearing seat. The rotating mechanism and the lifter assembly are matched to enable equipment to run more stably, so that the requirements of semiconductor equipment can be met in the rotation and lifting precision.

Description

technical field [0001] The invention relates to the field of single crystal silicon preparation equipment, in particular to a fully automatic furnace chamber lifting and rotating system. Background technique [0002] Monocrystalline silicon is the most basic material in electronic information materials and photovoltaic industries, and the Czochralski method single crystal furnace is the key technical equipment for producing silicon single crystal. The single crystal furnace is a device that melts raw silicon with a graphite heater in an inert gas environment, and grows a dislocation-free single crystal by the Czochralski method. In the process of charging, taking ingots, cleaning, etc., according to different needs, it is necessary to lift the auxiliary furnace chamber, isolation valve, furnace cover or main furnace chamber to a certain height and unscrew them to complete different task requirements. [0003] At present, in the scheme of realizing the lifting and rotating o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B15/30C30B29/06
Inventor 曹建伟傅林坚胡建荣高宇倪军夫叶钢飞春伟博谭庆梁成锋
Owner ZHEJIANG JINGSHENG MECHANICAL & ELECTRICAL