A device and method for measuring the third-order nonlinear photoelastic tensor of two-dimensional materials based on optical triple frequency
A technology of third-order nonlinear and two-dimensional materials, which is applied in the field of devices for measuring third-order nonlinear photoelastic tensor of two-dimensional materials based on optical triple frequency, which can solve the problems of limitation and sample damage
Active Publication Date: 2020-09-22
PEKING UNIV
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Problems solved by technology
At present, the commonly used methods for measuring the strain of two-dimensional materials are transmission electron microscopy, fluorescence spectroscopy, Raman spectroscopy, optical double-frequency spectroscopy, etc., but they often have limitations such as sample damage and limited material systems.
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Embodiment 1
[0026] The measurement of the third-order nonlinear photoelastic tensor of monolayer tungsten disulfide by optical triple frequency includes the following steps:
[0027] 1) if figure 1 As shown, the optical path includes a pulsed laser light source 1, a mirror 2, a first polarizer 3, a beam splitter 4, a 1 / 2 wave plate 5, an objective lens 6, a measured two-dimensional material and a strain applying device 7, and a second polarizer 8 , optical filter 9, spectrometer 10. Among them, the pulsed laser light source 1 has a wavelength of 1288nm, and the measured two-dimensional material sample is placed on the upper surface of the measured two-dimensional material and the strain applying device 7 . In this embodiment, the two-dimensional material sample to be tested is a single layer of tungsten disulfide.
[0028] Along the light emitting direction of the light source 1, the light source 1, the reflector 2, the first polarizer 3, the beam splitter 4, the 1 / 2 wave plate 5, the o...
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The invention discloses a device and method for measuring the third-order nonlinear photoelastic tensor of a two-dimensional material. The device comprises an ultra-fast laser source, a first polarizing film, a beam splitter, a 1 / 2 wave plate, a lens, a measured two-dimensional sample, a strain applying device, a reflector, a second polarizing film, an optical filter and a spectrograph. Accordingto the device and the method in the invention, measurement on the third-order nonlinear photoelastic tensor of the two-dimensional material is realized for the first time; a prerequisite condition isprovided for developing a method, which is not limited by a two-dimensional material system and used for measuring strain in the two-dimensional material based on optical tripling; optical, electricaland optoelectronic properties of the two-dimensional material are precisely controlled for a strain engineering; and thus, application thereof in the fields of optical, electrical and optoelectronicdevices and the like is greatly facilitated.
Description
technical field [0001] The invention belongs to the technical fields of spectroscopy and optoelectronics, and relates to a device and method for measuring the third-order nonlinear photoelastic tensor of two-dimensional materials based on optical triple frequency. Background technique [0002] Two-dimensional materials refer to materials with one dimension in nanometer size (size less than 100 nanometers), such as nanofilms, superlattices, quantum wells, etc. The third-order nonlinear photoelastic tensor refers to the change of the third-order nonlinear susceptibility produced by the strain tensor acting on the two-dimensional material. Strain refers to the local relative deformation of an object under the action of factors such as external force and non-uniform temperature field. The rich two-dimensional material system provides a broad platform for the miniaturization of optoelectronic devices, but the electronic band structure, chemical reactivity, phase state, etc. of t...
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IPC IPC(8): G01B11/16
Inventor 刘开辉梁晶俞大鹏
Owner PEKING UNIV