SOI LIGBT device with diode clamping carrier storage layer
A carrier storage and diode clamping technology, applied in semiconductor devices, electrical components, circuits, etc., to achieve low turn-off loss, improved emitter injection efficiency, and low turn-on voltage drop
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Embodiment 1
[0036] An embodiment of the present invention provides an SOI LIGBT device with two diode clamps, such as Figure 2 ~ Figure 3 Commonly shown, it includes a semiconductor substrate 1 , a buried oxide layer region 2 on the semiconductor substrate 1 , and a semiconductor layer (SOI layer) on the buried oxide layer region 2 . The semiconductor layer includes a P-type semiconductor base region 3, a gate region, an N-type carrier storage region 6, a surface withstand voltage region 7, a P-type electric field shielding region 13, an N-type semiconductor buffer region 15, and a P-type collector region 16, The P-type semiconductor base region 3 and the gate region are located on one side of the semiconductor layer, the N-type semiconductor buffer zone 15 is located on the other side of the semiconductor layer, and the N-type carrier storage region 6 is located next to the P-type semiconductor base region 3, and the P-type electric field shielding The region 13 is located next to the g...
Embodiment 2
[0047] An embodiment of the present invention provides an SOI LIGBT device with three diode clamps, such as Figure 4 ~ Figure 5 Commonly shown, it includes a semiconductor substrate 1 , a buried oxide layer region 2 on the semiconductor substrate 1 , and a semiconductor layer (SOI layer) on the buried oxide layer region 2 . The semiconductor layer includes a P-type semiconductor base region 3, a gate region, an N-type carrier storage region 6, a surface withstand voltage region 7, a P-type electric field shielding region 13, an N-type semiconductor buffer region 15, and a P-type collector region 16, The P-type semiconductor base region 3 and the gate region are located on one side of the semiconductor layer, the N-type semiconductor buffer zone 15 is located on the other side of the semiconductor layer, and the N-type carrier storage region 6 is located next to the P-type semiconductor base region 3, and the P-type electric field shielding The region 13 is located beside the ...
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