Quantum dot transfer printing method

A technology of quantum dots and stamps, applied in the field of quantum dots, can solve problems such as incompleteness and defective quantum dot patterns
CN109927431AActive Publication Date: 2019-06-25TCL CORPORATION

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
TCL CORPORATION
Publication Date
2019-06-25

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The invention belongs to the technical field of quantum dots, and particularly relates to a quantum dot transfer printing method. The quantum dot transfer printing method comprises the following stepsthat a seal is provided, a deformation embedded body is arranged on a seal surface protruding part of the seal, and the deformation embedded body is obtained in the mode that an initial embedded bodymanufactured by materials containing shape memory polymers are deformed; a quantum dot initial film arranged on the surface of a donor substrate is provided, and the initial film is subjected to transfer printing onto the seal surface, provided with the deformation embedded body, of the seal to form a quantum dot patterned film layer; the seal with the quantum dot pattern film layer subjected totransfer printing makes contact with a target substrate, the deformation embedded body is restored to the initial embedded body, and thus the quantum dot pattern film layer is subjected to transfer printing onto the target substrate. According to the quantum dot transfer printing method, part of pattern residues finally caused by nonuniform stress restoring is reduced, the integrity of transfer printing of the quantum dot pattern film layer is improved, and externally-applied stress required by repeated using of the seal is reduced.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention belongs to the technical field of quantum dots, and in particular relates to a quantum dot transfer printing method. Background technique

[0002] Quantum dots have many advantages such as easy adjustment of luminescent color, high color saturation, solution processing, and high stability. Therefore, quantum dot luminescence is regarded as a strong competitor for the next generation of display technology. In the preparation of quantum dot thin films, the spin coating method is the fastest and convenient solution processing method with good film quality. Quantum dot films. At present, the methods of patterning quantum dots mainly include inkjet printing and transfer printing.

[0003] The conventional transfer printing process usually uses a viscoelastic stamp as a transfer carrier and uses kinetic control to achieve transfer. The transfer process specifically includes two steps. The first step is to transfer the quantum dot pattern fro...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More