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Aperture calibration method and multi-charged particle beam drawing device

A technology of charged particle beam and calibration method, applied in the direction of exposure device, circuit, discharge tube, etc. in photoengraving process, can solve the problem of missing part of beam array

Active Publication Date: 2021-07-20
NUFLARE TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In conventional multi-beam drawing devices, some of the multi-beams formed by the shaping aperture array do not pass through the openings of the blanking aperture array due to positional displacement, inclination, deformation, etc. in the height direction when the aperture is mounted on the device. , and there is the problem that part of the beam array that should be imaged on the sample surface may be missing

Method used

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  • Aperture calibration method and multi-charged particle beam drawing device
  • Aperture calibration method and multi-charged particle beam drawing device
  • Aperture calibration method and multi-charged particle beam drawing device

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Embodiment Construction

[0023] Embodiments of the present invention will be described below based on the drawings. In the embodiment, a configuration using an electron beam as an example of a charged particle beam will be described. However, the charged particle beam is not limited to an electron beam, and may be an ion beam or the like.

[0024] figure 1 The drawing apparatus 1 shown includes: a drawing unit 10 for irradiating an object such as a mask or a wafer with electron beams to draw a desired pattern; and a control unit 60 for controlling the drawing operation by the drawing unit 10 . The drawing unit 10 is an example of a multi-beam drawing device having an electron beam column 12 and a drawing chamber 30 .

[0025] Inside the electron beam column 12 are arranged an electron gun 14 , an illumination lens 16 , a shaping aperture array 18 , a blanking aperture array 20 , a deflector 22 , an aperture limiting member 24 , and an objective lens 26 . An XY stage 32 is arranged in the drawing ro...

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Abstract

The aperture calibration method of this embodiment includes a step of switching on / off of each of the plurality of beams using a blanking aperture array, and a step of detecting a beam current on a stage using a detector. A part of the plurality of beams is turned on, the blanked aperture array is scanned, and a current flow map is created based on the detection result of the beam current by the detector and the position of the blanked aperture array. The bundles that are turned on are switched, and the above-mentioned current flow diagram is created for each turned-on bundle. The position of said array of blanking apertures is adjusted according to the current flow map of each of said turned on beams.

Description

technical field [0001] The invention relates to an aperture calibration method and a multi-charged particle beam drawing device. Background technique [0002] Along with the high integration of LSI, the circuit line width required for semiconductor devices has become smaller and smaller year by year. In order to form the desired circuit pattern on the semiconductor device, the high-precision original pattern (mask, or especially used in the stepper exposure device and scanner) is used to reduce the projection type exposure device. Artwork pattern is also known as reticle.) A method of reducing transfer onto a wafer. High-precision artwork patterns are drawn by an electron beam drawing device, using so-called electron beam lithography. [0003] A drawing apparatus using multiple beams can irradiate more beams at a time than a case of drawing with a single electron beam, so that productivity can be significantly improved. In a multi-beam drawing device using a blanking aper...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/2059H01J37/045H01J37/3177H01J2237/024H01J2237/0435H01J2237/1501H01J37/20
Inventor 饭塚修
Owner NUFLARE TECH INC