Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of device and oblique scanning method based on digital micromirror ldi

A technology of digital micromirror and prism, which is applied to devices based on digital micromirror LDI and oblique scanning, and oblique scanning, which can solve problems such as difficult to cover PCB accuracy requirements, and achieve the effect of simplifying data processing difficulty and compensating accuracy errors

Active Publication Date: 2020-12-18
东莞市多普光电设备有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the DMD digital micromirror itself is in the shape of grid pixels, and the simple direct scan method is difficult to cover the precision requirements of the PCB

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of device and oblique scanning method based on digital micromirror ldi
  • A kind of device and oblique scanning method based on digital micromirror ldi
  • A kind of device and oblique scanning method based on digital micromirror ldi

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] In order to further understand the features, technical means, specific objectives and functions achieved by the present invention, and to analyze the advantages and spirit of the present invention, a further understanding of the present invention can be obtained through the following detailed description of the present invention in conjunction with the accompanying drawings and specific embodiments.

[0022] See attached figure 1 : Schematic diagram of the structure of a single imaging module of LDI;

[0023] attached figure 2 Yes: a schematic diagram of the inclined mask 13, the light-transmitting part of the single hole 31 (the window opening) is inside the circular line;

[0024] attached image 3 Yes: the grayscale coding of the target surface 15 is composed of several single imaging spots 51 with controllable grayscales.

[0025] The present invention specifically adopts a total internal reflection TIR optical path structure, and completes oblique scanning thro...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a device based on a digital micromirror LDI and inclined scanning method, wherein inclined scanning is completed through two groups of imaging lenses and an inclined mask. Theinvention comprises a DMD digital micromirror, wherein a total internal reflection TIR prism is arranged between the DMD digital micromirror and the first group of imaging lenses, one end of the firstgroup of imaging lenses, which is far away from the DMD digital micromirror, is provided with an inclined mask, one end of the inclined mask, which is far away from the first group of imaging lenses,is provided with the second group of imaging lenses, and one end of the second group of imaging lenses, which is far away from the inclined mask, is provided with a target surface. The invention realizes the inclined scanning function, simplifies the data processing difficulty during exposure pattern rasterization and compensates the precision error caused on the developing process. According tothe invention, each row of pixels generates a certain displacement, and finally, the arrangement like a parallelogram appears on the target surface, so that the data processing difficulty during exposure pattern rasterization is simplified.

Description

technical field [0001] The invention relates to the field of PCB without film exposure, in particular to a digital micromirror LDI-based device and an oblique scanning method, in particular to a method for completing oblique scanning through two sets of imaging lenses and an oblique mask. Background technique [0002] The traditional exposure machine is one of the most important equipment in the current printed circuit board (PCB) manufacturing process, and its exposure quality determines the yield rate and line width accuracy of the PCB. As the requirements for PCB line width and line spacing become narrower and narrower, the demand for film-free exposure technology becomes more urgent, and LDI laser direct imaging technology develops rapidly; currently, digital micromirror imaging solutions are mainly used in the market. However, the DMD digital micromirror itself is in the shape of grid pixels, and the simple direct scan method is difficult to cover the accuracy requireme...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70366
Inventor 蔡文涛邱田生陈振才
Owner 东莞市多普光电设备有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com