Wafer producing method and wafer producing apparatus
A wafer and single crystal technology, applied in the field of wafer generation and wafer generation equipment, can solve the problems of poor production efficiency and difficulty in judging whether the wafer peeling is completed or not
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[0028] Below, while referring to the attached Figure 1 Embodiments of the wafer production method and the wafer production apparatus of the present invention will be described.
[0029] First, the wafer production apparatus of the present invention will be described. figure 1 The wafer production apparatus 2 shown has: an ingot holding unit 4 that holds a hexagonal single crystal SiC ingot (hereinafter, simply referred to as “ingot”); an ultrasonic wave generating unit 6 that generates ultrasonic waves and has a The opposite end face 6a; the water supply member 8, which provides water between the wafer to be generated and the ultrasonic generating unit 6 to form a water layer; the microphone 10, which is arranged adjacent to the ingot, and controls the sound transmitted from the ingot to the air. The sound is collected; the detachment detection member 12 is connected with the microphone 10 and detects the detachment of the wafer to be produced from the ingot according to the...
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