Vacuum device, attraction device, and conductive thin film manufacturing device
A technology of adsorption device and vacuum device, which is applied in semiconductor/solid-state device manufacturing, vacuum evaporation coating, and holding device for application of electrostatic attraction, etc. It can solve the problems that the film growth rate cannot be increased.
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[0076] The present invention was conceived to solve the above-mentioned disadvantages of the prior art, and aims to provide a technique capable of stably growing a conductive film on a dielectric substrate.
[0077] figure 1 The symbol 2 in the symbol 2 shows the vacuum device of the present invention, which has a vacuum chamber 11 , an adsorption device 12 and a target device 13 .
[0078] A rotating device 26 such as a motor and a sputtering power source 23 are disposed outside the vacuum chamber 11 .
[0079] The target device 13 has a sputtering target 17 to be sputtered and a cathode electrode 16 on which the sputtering target 17 is mounted, and the cathode electrode 16 is connected to a sputtering power supply 23 .
[0080] The adsorption device 12 has a rectangular or square adsorption plate 14 and a rod-shaped rotating shaft 15 arranged on one side of the adsorption plate 14. The rotating shaft 15 is connected to the rotating device 26, and the rotating shaft 15 rota...
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