Overstable three-electrode electron beam evaporation source

An electron beam evaporation, three-electrode technology, applied in vacuum evaporation coating, ion implantation coating, metal material coating process, etc., can solve the problems of complicated electron beam trajectory control method, easy pollution of evaporation materials, uneven heating, etc. , to increase the types of targets, improve the compatibility of the device, and prolong the life of the device

Pending Publication Date: 2019-08-13
FERMION INSTR SHANGHAI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In the prior art, ordinary electron beam sources have the problems of uneven heating, easy contamination of filaments by evaporating materials, and complicated control methods of electron beam trajectories.

Method used

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  • Overstable three-electrode electron beam evaporation source
  • Overstable three-electrode electron beam evaporation source

Examples

Experimental program
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Effect test

Embodiment 1

[0023] In a specific embodiment of the present invention, an ultra-stable three-electrode electron beam evaporation source includes: a target 1, a filament 2 and a support base 3; wherein, the target 1 is fixed to the support base 3; the filament 2 It is a high-temperature-resistant metal material, fixed to the support base 3, set above the target 1, and the filament 2 is connected to negative electricity.

[0024] In this specific embodiment, the filament 2 can be made of a high-temperature-resistant metal material, and the main body of the support base 3 can be made of a high-temperature-resistant metal material, or a high-temperature-resistant ceramic material that has high strength, can maintain shape at high temperature, and is insulated. The material can prevent the short circuit of the filament 2 and / or the target 1 connected to the support base 3 from causing the evaporation rate of the evaporation source to be unstable. The filament 2 and the target 1 can be fixed to ...

Embodiment 2

[0038] In a preferred embodiment, an ultra-stable three-electrode electron beam evaporation source, such as figure 2 As shown, the difference from Embodiment 1 is that it further includes a loading crucible 5 , the loading crucible 5 is fixed to the supporting base 3 , and the target 1 is arranged in the loading crucible 5 . When the target material 1 is difficult to be processed into a suitable shape or fixed to the support base 3 , a crucible 5 fixed to the support base 3 may be provided in the evaporation source. The main body of the crucible can be made of high temperature resistant metal materials such as tantalum, molybdenum or tungsten, or high temperature resistant insulating materials such as ceramics. A water cooling device can also be installed inside the crucible to cool the crucible so as to prevent the melting of the crucible from polluting the target 1 or the evaporation of the crucible leading to a decrease in the quality of the steam. It can also reduce the t...

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Abstract

The invention provides an overstable three-electrode electron beam evaporation source which is used for solving the problems that an electron beam evaporation device in the prior art is complex in structure, an electron beam source is not uniform in heating, evaporation materials are prone to polluting a lamp filament, and an electron beam trajectory control method is complex. The overstable three-electrode electron beam evaporation source comprises a target material, a lamp filament and a supporting base, wherein the target material is fixed to the supporting base; and the lamp filament is ahigh-temperature resisting metal material, fixed to the supporting base, arranged above the target material and connected with negative electricity. By implementing the technical scheme provided by the invention, a reflecting plate is arranged between the target material and the lamp filament, the electron beam trajectory can be controlled conveniently and fast, in addition, the lamp filament polluting speed is slowed down, the service life of a device is prolonged, the device structure is simplified, and the device outgassing rate is decreased; and the reflecting plate is connected with negative electricity, the voltage of the negative electricity is continuously adjustable, uniform-speed evaporation of the end of the target material is facilitated, the evaporation source is applicable tomore types of target materials, and the device compatibility is improved.

Description

technical field [0001] The invention relates to the field of electron beam evaporation sources, in particular to an ultra-stable three-electrode electron beam evaporation source. Background technique [0002] Electron beam evaporation is a physical vapor deposition method that uses electrons to bombard the target to achieve target evaporation. It can be used to prepare high-purity thin film materials for use in electronic chip manufacturing or scientific research and other fields. The control method of electron beam is mainly divided into e-beam source with magnetic field and ordinary electron beam source without magnetic field. The e-type electron beam source is complex in structure and expensive in cost because it uses magnetic field and electric field coupling to control electrons. The ordinary electron beam source does not use a magnetic field, so the structure is simple and easy to use. In the prior art, common electron beam sources have the problems of non-uniform he...

Claims

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Application Information

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IPC IPC(8): C23C14/30
CPCC23C14/30
Inventor 谢斌平阿力甫·库提鲁克李浩
Owner FERMION INSTR SHANGHAI CO LTD
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