Method for producing layered material wrinkles

A layered material and fold technology, which is applied in the field of rapid preparation of layered material folds, can solve the problems of high difficulty, high energy consumption, and cumbersome methods, and achieve the effects of low cost, low energy consumption, and simple preparation process

Active Publication Date: 2019-08-23
INST OF PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0012] Therefore, the object of the present invention is to prepare layered materials (such as graphene, MoS 2 , W 2 , WSe 2 etc.) The method of wrinkled structure is cumbersome, high energy consumption, high difficulty and other disadvantages, providing a method for preparing layered material folds, which can simply and efficiently obtain large-area wrinkled structures, reduce scientific research costs, and improve scientific research efficiency

Method used

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  • Method for producing layered material wrinkles
  • Method for producing layered material wrinkles
  • Method for producing layered material wrinkles

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0047] (1) with 4×4cm 2 PDMS membrane as the substrate.

[0048] (2) Use tweezers to pick up highly oriented pyrolytic graphite (HOPG) crystals purchased from Nanjing Xianfeng Nano Co., Ltd., adhere to the surface of the PDMS film, and use multiple PDMS films of the same size to repeatedly cleavage, that is Thin-layer graphene was obtained on PDMS membrane.

[0049] (3) Put the PDMS film sample with graphene into liquid nitrogen to quench quickly, stay for 5 seconds, take it out quickly and place it in room temperature environment, and then the graphene wrinkle structure can be obtained on the surface of the PDMS film.

[0050] (4) Repeat step (3) many times to obtain more wrinkled structures. The obtained folds can be directly observed by an optical microscope, and the folds form a converging network structure, and the pitch of the folds is usually in the range of 1 to 20 microns. The height and width of the wrinkles can be characterized by atomic force microscopy. The di...

Embodiment 2

[0053] (1) in 1×1cm 2 silica gel membrane as the substrate.

[0054] (2) Pick up MoS purchased from Nanjing Xianfeng Nano Co., Ltd. with tweezers 2 Crystals, adhered to the surface of the silica gel membrane, and repeatedly cleaved with multiple silica gel membranes of the same size, that is, a thin layer of MoS was obtained on the silica gel membrane. 2 .

[0055] (3) will have MoS 2 The silica gel film sample is quickly put into liquid nitrogen to quench, stay for 10 seconds, quickly take it out and place it at room temperature, and MoS can be obtained on the surface of the silica gel film. 2 wrinkled structure.

[0056] (4) Repeat step (3) many times to obtain more wrinkled structures. The obtained folds can be directly observed by an optical microscope, and the folds form a converging network structure, and the pitch of the folds is usually in the range of 1 to 20 microns. figure 2 (b) is the multilayer MoS on the silica gel substrate that embodiment 2 makes 2 wrin...

Embodiment 3

[0058] (1) in 1×1cm 2 silica gel membrane as the substrate.

[0059] (2) Use tweezers to pick up WSe purchased from hq-graphene company 2 Crystals, adhered to the surface of the silica gel membrane, and repeatedly cleaved with multiple silica gel membranes of the same size, that is, a thin layer of WSe was obtained on the silica gel membrane. 2 .

[0060] (3) will have WSe 2 The silica gel membrane sample is quickly put into liquid nitrogen to quench, stay for 10 seconds, quickly take it out and place it at room temperature, and then WSe can be obtained on the surface of the silica gel membrane. 2 wrinkled structure.

[0061] (4) Repeat step (3) many times to obtain more wrinkled structures. The obtained folds can be directly observed by an optical microscope, and the folds form a converging network structure, and the pitch of the folds is usually in the range of 1 to 20 microns. figure 2 (c) is the multilayer WSe on the silica gel substrate that embodiment 3 makes 2 w...

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Abstract

The invention provides a method for producing layered material wrinkles. The method comprises the following steps of (1) using a film as a substrate, and conducting mechanical cleavage on a layered material to obtain a substrate-layered material; (2) placing the substrate-layered material obtained in the step (1) in liquid nitrogen for quenching, taking out the quenched substrate-layered material,and placing the quenched substrate-layered material in an environment of room temperature; and (3) optionally, repeating the step (2). By means of the method, large-area wrinkle structures can be obtained simply and efficiently, the scientific research cost is reduced, and the scientific research efficiency is improved.

Description

technical field [0001] The present invention belongs to the field of layered materials. In particular, the present invention relates to a method for the rapid preparation of folds in layered materials. Background technique [0002] Since graphene was reported in 2004, other layered materials such as hexagonal boron nitride (h-BN), transition metal dichalcogenides (TMD), etc. have also received more and more attention. These two-dimensional materials Shows extraordinary chemical, physical and mechanical properties. [0003] In particular, graphene, as a new two-dimensional material, will have great application prospects in flexible electronic devices, and flexible electronic devices will inevitably be deformed, and repeated deformation will cause fatigue and fracture of the material. In addition, although graphene is considered to have very good mechanical properties, single-layer graphene is still very fragile from a macroscopic point of view, prone to fracture and fragmen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B19/04C01B32/184C01G15/00C01G39/06
CPCC01B19/007C01B32/184C01G15/00C01G39/06C01P2004/04
Inventor 黄元
Owner INST OF PHYSICS - CHINESE ACAD OF SCI
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