Temperature control system, photoetching device and temperature control method
A temperature control system and temperature control technology, which are used in photoplate-making process exposure devices, refrigeration and liquefaction, microlithography exposure equipment, etc., to achieve the effects of rapid output, improved temperature control accuracy, and expanded temperature control range
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[0022] The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and through specific implementation methods. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.
[0023] figure 1 It is a structural block diagram of the temperature control system provided by the embodiment of the present invention. The temperature control system is suitable for temperature control of any equipment (temperature control object) that needs to work at a desired temperature. Such as figure 1 As shown, the temperature control system provided by the embodiment of the present invention includes a temperature control medium supply module 10 , a cooling a...
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