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Temperature control system, photoetching device and temperature control method

A temperature control system and temperature control technology, which are used in photoplate-making process exposure devices, refrigeration and liquefaction, microlithography exposure equipment, etc., to achieve the effects of rapid output, improved temperature control accuracy, and expanded temperature control range

Inactive Publication Date: 2019-10-11
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In view of this, the object of the present invention is to propose a temperature control system, photolithography device and temperature control method to increase the output of cold or heat, expand the temperature control range of the vortex tube, improve the temperature control accuracy, and realize heat and heat. The rapid output of cooling capacity can improve the problem of energy waste

Method used

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  • Temperature control system, photoetching device and temperature control method
  • Temperature control system, photoetching device and temperature control method
  • Temperature control system, photoetching device and temperature control method

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Embodiment Construction

[0022] The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and through specific implementation methods. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0023] figure 1 It is a structural block diagram of the temperature control system provided by the embodiment of the present invention. The temperature control system is suitable for temperature control of any equipment (temperature control object) that needs to work at a desired temperature. Such as figure 1 As shown, the temperature control system provided by the embodiment of the present invention includes a temperature control medium supply module 10 , a cooling a...

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PUM

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Abstract

The invention discloses a temperature control system, a photoetching device and a temperature control method. The temperature control system comprises: a temperature control medium supply module whichis used for providing temperature control air flow for a cold and heat output module; the cold and heat output module which comprises a vortex tube in multi-stage series connection and is used for outputting cold and / or heat to a temperature control object; a temperature control detection module which is used for detecting temperature control parameters, wherein the temperature control parametersat least comprise cold air flow and cold air temperature corresponding to output cold and / or hot air flow and heat temperature corresponding to output heat and the temperature of the temperature control object; and a control module which is used for adjusting the cold air flow and the cold temperature and / or the hot air flow and the heat temperature according to the temperature control parametersso as to enable the temperature of the temperature control object to reach a target temperature. The system increases the output of cold or heat, enlarges the temperature control range of the vortextube, simultaneously carries out the rapid output of the heat and the cold and solves the problem of energy waste.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of temperature control, and in particular, to a temperature control system, a photolithography device, and a temperature control method. Background technique [0002] Vortex tube refrigeration has been widely used in modern industry. For example, in the semiconductor manufacturing production line, the lithography machine has the characteristics of being in operation for a long time, and the cooling of the mask table also needs to quickly output the cooling capacity and keep it stable. At the same time, it needs to have a small and light refrigeration system. The vortex tube refrigeration method only needs to consume the compressed air provided by the factory air compressor to quickly cool the mask table of the photolithography machine, and avoids the traditional refrigeration system such as vapor compression refrigeration. Refrigerant consumption and pollution problems reduce costs and...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F25B9/04F25B49/02G03F7/20
CPCF25B9/04F25B49/02G03F7/70875
Inventor 孟祥麒郝保同
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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