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Near-infrared optical filter, preparation method thereof and optical filtering equipment

A near-infrared and optical filter technology, which is applied in the field of near-infrared optical filters and their preparation, can solve the problems of high cost, difficult preparation, and low yield, and achieve the effect of low cost and simple operation

Inactive Publication Date: 2019-12-17
LENS TECH CHANGSHA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The first purpose of the present invention is to provide a near-infrared filter to alleviate the difficulty of preparation due to the relatively thick thickness of the near-infrared filter in the prior art, poor filtering effect and low yield, and many layers of materials. and costly technical problems

Method used

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  • Near-infrared optical filter, preparation method thereof and optical filtering equipment
  • Near-infrared optical filter, preparation method thereof and optical filtering equipment
  • Near-infrared optical filter, preparation method thereof and optical filtering equipment

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preparation example Construction

[0039] The present invention also provides the preparation method of the above-mentioned near-infrared filter, which alternately prepares SiO on the surface of the glass substrate. 2 film and SiH film. The method is simple in operation, low in cost, does not require special equipment and process conditions, and is suitable for industrialized and automatic production.

[0040] In a preferred embodiment of the present invention, the sputtering process is used to alternately deposit SiO on the surface of the glass substrate. 2 film and SiH film.

[0041] In a preferred embodiment of the present invention, in the sputtering process, Si is used as the target material, and oxygen and hydrogen are alternately fed in sequence as the reaction gas, and SiO is alternately deposited on the surface of the glass substrate. 2 film and SiH film. The Si target is sputtered on the surface of the glass substrate by the sputtering process, and the Si target forms a silicon film on the glass su...

Embodiment 1-6

[0052] For the near-infrared filter provided by Embodiment 1-5, the glass substrate is sapphire glass, and a filter layer is provided on the surface of one side of the sapphire glass, and the filter layer includes SiO2 which is arranged alternately in sequence. 2 film and SiH film. For the near-infrared filter provided in Example 6, the glass substrate is ordinary glass, and a filter layer is also provided on one side of the ordinary glass, and the filter layer includes SiO 2 film and SiH film. Among them, SiH film layer and SiO 2 The specific information of the thickness and number of layers of the film layer is shown in the table below:

[0053]

[0054]

Embodiment 7

[0056] The present embodiment provides a kind of preparation method of near-infrared filter, comprises the following steps:

[0057] Step a): Use Guangchi 1650 sputtering machine at a vacuum of 8.0×10-3 Under the condition of Pa, use 45-65sccm argon to sputter the Si target onto the surface of the substrate to form a silicon film;

[0058] Step b): Using 50 sccm of argon gas and 280 sccm of oxygen gas, oxygen is plasmaized by ICP, and reacts with the silicon film in step a to form SiO 2 Thin film, the rate in the thickness direction is 0.7nm / s;

[0059] Step c): SiO 2 After the film is complete, continue on the SiO 2 Prepare a silicon film on the film, use the conditions of argon gas 50 sccm, hydrogen gas 400 sccm to plasma the hydrogen gas by ICP, and SiO 2 The silicon film on the film reacts to form a SiH film, and the rate in the thickness direction is 0.36nm / s;

[0060] Step d): repeat and alternately prepare SiH film layer and SiO on the substrate 2 film layer, and f...

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Abstract

The invention relates to the technical field of optical devices, and particularly provides a near-infrared optical filter, a preparation method thereof and optical filtering equipment. The near-infrared optical filter provided by the invention comprises a glass substrate and an optical filtering layer arranged on the surface of one side of the glass substrate, wherein the optical filtering layer comprises SiO2 film layers and SiH film layers which are alternately arranged in sequence, the SiO2 film layers are in contact with the glass substrate, a sum of the number of the SiO2 film layers andthe number of the SiH film layers ranges from 20 to 40, and the thickness of the optical filtering layer ranges from 3000 to 4500 nm. According to the near-infrared optical filter, the SiH film layersare high-refractive-index thin films, the SiO2 film layers are low-refractive-index thin films, and the optical filter layer obtained by alternately stacking the two thin films is used for preparingthe near-infrared optical filter, so that the near-infrared optical filter plays an effective optical filtering role. The preparation method of the near-infrared optical filter provided by the invention is simple to operate and low in cost, does not require special equipment and process conditions and is suitable for industrial and automatic production.

Description

technical field [0001] The invention relates to the technical field of optical devices, in particular to a near-infrared filter, a preparation method thereof, and a filter device. Background technique [0002] Near-infrared filters play an important role in aerospace meteorology, natural disasters, resource surveys, remote sensing systems, infrared cameras, and many military products. From the perspective of optical coating, the near-infrared filter is an optical device that has high transmittance for a specific band and a high cut-off for another characteristic band. Near-infrared filters have extremely high requirements on the thickness of each film layer, the firmness of the film layer and the optical performance. However, there are very few varieties of near-infrared filters to choose from at present, and the preparation is difficult, the product yield is low, the cost is high, and the filtering effect is poor, which are technical problems that need to be solved. [00...

Claims

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Application Information

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IPC IPC(8): G02B5/28
CPCG02B5/281G02B5/285
Inventor 周群飞朱斌
Owner LENS TECH CHANGSHA
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