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Manufacturing method of array substrate, array substrate and display panel

The technology of an array substrate and manufacturing method, which is applied in the field of liquid crystal display, can solve the problems of complex process and high production cost, and achieve the effect of simple process, low manufacturing cost and reduced number of times

Active Publication Date: 2021-07-09
CHENGDU ZHONGDIAN PANDA DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The six photolithography process provided by the above-mentioned prior art is complex in process and high in production cost

Method used

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  • Manufacturing method of array substrate, array substrate and display panel
  • Manufacturing method of array substrate, array substrate and display panel
  • Manufacturing method of array substrate, array substrate and display panel

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] figure 1 A schematic flowchart of the method for manufacturing an array substrate provided in Embodiment 1 of the present invention, as shown in figure 1 As shown, the manufacturing method of the array substrate of this embodiment includes:

[0031] S10 , depositing a gate metal layer on the base substrate, and performing a first photolithography process to form a gate on the base substrate.

[0032] figure 2 For the structure diagram of the array substrate in the first state in the method for fabricating the array substrate provided in Embodiment 1 of the present invention, refer to figure 2 As shown, it is first necessary to deposit a thickness of about Specifically, sputtering or thermal evaporation is used to deposit the gate metal layer. The gate metal layer can be selected from metals or alloys such as Cr, W, Cu, Ti, Ta, Mo, etc., and is composed of multiple layers of metal. The gate metal layer can also meet the needs. Secondly, the first photolithograp...

Embodiment 2

[0054] This embodiment provides an array substrate, which is manufactured by the manufacturing method described in Embodiment 1. Figure 14 A schematic structural diagram of the array substrate provided in Embodiment 2 of the present invention, as shown in Figure 14 As shown, the array substrate of this embodiment includes: a base substrate 1, a gate 2, a gate insulating layer 3, a metal oxide semiconductor pattern 4, a protection pattern 5, a source electrode 6 and a drain electrode 7, a passivation layer 8, The pixel electrode 13, the conductive via hole 9, the gate 2 is arranged on the base substrate 1, the gate insulating layer 3 covers the gate 2 and the base substrate 1, and the metal oxide semiconductor pattern 4 covers part of the gate insulation. layer 3 and is located above the gate 2, the protection pattern 5 covers the metal oxide semiconductor pattern 4, the source electrode 6 and the drain electrode 7 are arranged above the metal oxide semiconductor pattern 4 an...

Embodiment 3

[0066] This embodiment provides a display panel, including a color filter substrate, a liquid crystal layer, and the array substrate described in Embodiment 2, and the liquid crystal layer is interposed between the color filter substrate and the array substrate. The specific structure and functions of the array substrate have been described in detail in the foregoing second embodiment, so details will not be repeated here.

[0067] Another aspect of this embodiment further provides a display device, including the above display panel. The display device may be a flexible display device. In this embodiment, the display device may be an electronic paper, a tablet computer, or a liquid crystal display.

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Abstract

The invention provides a manufacturing method of an array substrate, an array substrate and a display panel. The manufacturing method of the array substrate includes: depositing a gate metal layer on the base substrate, and performing the first photolithography process to form a gate on the base substrate; Electrode insulating layer, metal oxide semiconductor layer and protective layer, and perform a second photolithography process to form metal oxide semiconductor patterns and protective patterns; deposit source and drain metal layers, and perform a third photolithography process to Form the source and drain. The invention can reduce the times of photolithography process, has simple process and low manufacturing cost.

Description

technical field [0001] The invention relates to the field of liquid crystal display, in particular to a method for manufacturing an array substrate, the array substrate and a display panel. Background technique [0002] With the development of display technology, flat display devices such as liquid crystal displays (LCD) are widely used in mobile phones, televisions, personal In various consumer electronic products such as digital assistants and notebook computers, it has become the mainstream of display devices. A liquid crystal display panel is generally composed of an array substrate, a color filter substrate, and a liquid crystal molecular layer sandwiched between the array substrate and the color filter substrate. By applying a driving voltage between the array substrate and the color filter substrate, the liquid crystal molecules can be controlled to rotate, so that the light from the backlight module is refracted to produce a picture. [0003] The manufacturing meth...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/12
CPCH01L27/1214H01L27/1259
Inventor 刘翔孙学军李广圣
Owner CHENGDU ZHONGDIAN PANDA DISPLAY TECH CO LTD