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Plasma gun

A technology of plasma gun and conductor, which is applied in the field of plasma, can solve the problems of low current density of the plasma source, and achieve the effects of reducing the difficulty of generation, increasing the current density, and reducing the maintenance voltage

Inactive Publication Date: 2020-01-17
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of this invention is to provide a kind of plasma gun, which is used to solve or partly solve the problem that most existing plasma sources have relatively low current density

Method used

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Embodiment Construction

[0019] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0020] In the description of the present invention, it should be noted that unless otherwise specified and limited, the terms "installation", "connection" and "connection" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection. Connected, or integrally connected; it may be mechanically connected or electrically connected; it may be directly connected or indirectly connected through an intermediary, and it may be the internal communication of two components. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention in specific situations.

[0021] An embodiment of...

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Abstract

The invention relates to the technical field of plasmas. The invention discloses a plasma gun. The plasma gun comprises an anode, a cathode and a gasket group, a discharge channel is formed between the anode and the cathode, the gasket group comprises a plurality of annular conductor gaskets and a plurality of annular insulation gaskets, the conductor gaskets and the insulation gaskets are sequentially arranged at intervals, the gasket group and the discharge channel are coaxially arranged on the discharge channel, and the inner diameter of the conductor gaskets is smaller than that of the insulation gaskets. According to the plasma gun provided by the invention, the gasket group is arranged on the discharge channel, so that discharge can be generated on the inner side of the conductor gasket when a power supply is applied, initial plasma is generated through ionization, and smooth generation of the plasma is facilitated; and due to the arrangement structure of the gasket group, the avalanche effect can be achieved under the conditions of discharge voltage and air pressure, high-density electrons can be generated, and the density of generated plasma electrons is large.

Description

technical field [0001] The invention relates to the field of plasma technology, in particular to a plasma gun. Background technique [0002] The development of high-power pulse technology and microwave devices creates an urgent requirement for continuously working electron beam sources. The development of pre-ionization technology, neutral beam technology and non-inductive starting technology in thermonuclear fusion engineering research also creates an urgent requirement for high current density plasma sources working at low pressure. [0003] Traditional hot cathode emitting plasma sources and inductive plasma sources can generate long-pulse plasma, but they require a large number of cooling devices, are large in size, and their application scenarios are limited. Moreover, the generated plasma current is small, which cannot meet the requirements of thermonuclear plasma. The need for plasma sources in fusion engineering research. Although the plasma cathode electron gun ca...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/34
CPCH05H1/34H05H1/3452
Inventor 信韬谭熠高喆王文浩
Owner TSINGHUA UNIV
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