Etching device for lens protection sheet and etching method based on the device
An etching device and protective sheet technology, which is applied to chemical instruments and methods, surface etching compositions, etc., can solve the problems of low automation, labor cost, uneven etching, etc., and achieve high automation and improve etching effect Effect
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Embodiment 1
[0026] Such as figure 1 As shown, the etching device for the lens protection sheet of the present embodiment includes a rotating base, a telescopic etching mechanism arranged on the rotating base, a lens protection sheet transmission mechanism above the telescopic etching mechanism, and simultaneously with the rotating base, the telescopic etching mechanism Mechanism, the controller 7 that the lens protection sheet transmission mechanism is connected.
[0027] Such as figure 2 As shown, the telescopic etching mechanism includes an etching tank 3 installed on a rotating base through a cylinder 4, and the inside of the etching tank 3 is provided with a rough etching tank 11, a cleaning tank 12 and a micro etching tank. 13 partition plate 17; the cylinder 4 is connected with the controller 7, and when the cylinder 4 stretches, it can drive the etching tank 3 to rise or fall.
[0028] The lens protection sheet conveying mechanism includes a conveying motor (not shown in the fig...
Embodiment 2
[0035] The present embodiment adopts the lens protective sheet etching method of the etching device in embodiment 1, and it specifically comprises the following steps:
[0036]Step 1: Add coarse etching solution to the rough etching tank, add micro etching solution to the micro etching tank, add clear water to the cleaning tank, and place the lens protection sheet coated with photoresist in the etching basket, and the controller controls the transmission The motor works to make the conveyor chain move, and then the etching basket moves with the conveyor chain. The raw materials of the rough etching solution described in this embodiment include by mass percentage: 20% ammonium hydrofluorate, 22% oxalic acid, 20% ammonium sulfate, 3.8% glycerin, 22% barium sulfate, 3% fatty alcohol polyoxyethylene ether, The balance is water. The raw materials of the micro-etching solution include: 5% ammonium bifluoride, 15% hydrofluoric acid, 20% oxalic acid, 6% ammonium fluoride, 8% ammonium...
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