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Plasma source and plasma treatment device

A plasma source and plasma technology, applied in plasma, treatment, electrotherapy, etc., can solve the problem of excessive ozone generation in safety

Active Publication Date: 2020-02-25
ATI株式会社 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Also, it is actually difficult to form a uniform surface discharge over the area, and in the configuration of the planar electrodes, the applied voltage for plasma discharge also has problems of safety and excessive ozone generation.

Method used

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  • Plasma source and plasma treatment device
  • Plasma source and plasma treatment device
  • Plasma source and plasma treatment device

Examples

Experimental program
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Embodiment Construction

[0044] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings.

[0045] The present invention provides a medical device that uses a plasma source to cause plasma discharge, and acts on wounded or burned skin with radicals generated during the process, thereby preventing infection and promoting skin regeneration.

[0046] figure 1 It is a figure which shows the front and back of the plasma therapy apparatus of this invention.

[0047] A control interface and keys are arranged on the upper end of the main body, and a head unit on which a plasma source can be installed is formed at the end of the mechanical arm extending from the upper end of the main body. The mechanical arm is a rotatable structure, so that it can be arranged in a desired direction, and a foldable connecting portion whose length can be adjusted is formed on the upper end of the head. There is a door behind the main body, and inside the door is a ...

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Abstract

The invention provides a plasma source and a plasma treatment device. In particular, the present invention provides a plasma source of a large area, which is suitable for treatment of a cut or burn, and a unit capable of performing even plasma discharge in the plasma source of a large area. To achieve the purpose of the present invention, the plasma source of the large area includes: an electrodepanel of a large area, having a dielectric covering an electrode, wherein the electrode having multiple discharge points is formed on a substrate; an output panel arranged on one side of the electrodepanel to be spaced from the electrode panel and including an air barrier individually formed at both ends facing each other on the electrode panel, wherein multiple blow holes are formed on the output panel; and a slit nozzle module consistently supplying gas between the electrode panel and the output panel and assembled to an end of the output panel and the electrode panel without the air barrier so that gas is collected in the space formed at intervals between the panels.

Description

technical field [0001] The invention relates to a treatment device utilizing plasma, in particular to a treatment device capable of effectively treating wounds or burns. Background technique [0002] Recently, plasmas have been used not only in semiconductor manufacturing, nuclear fusion, and various surface treatments, but also in conjunction with biological applications. This kind of fusion technology requires not only the high-energy properties of plasmas today, but also various properties required in the biological field. Plasma can generate different types and concentrations of active species according to the characteristics of the discharge gas and the applied voltage, and the lifetime of the active species can also be different. The difference in the properties of such active species should be differently controlled according to the specific circumstances of the desired application, and in order to achieve commercialization in the biological field, safety and reliabi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61N1/44
CPCA61N1/44H05H1/2439H05H1/0006H05H1/2425A61L2/0011A61L2/14A61N1/0468H05H2277/10H05H2245/36
Inventor 安头白金东逸崔银河李相学崔珍成
Owner ATI株式会社
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