Metal reticle, display panel and display device

A metal mask, display panel technology, applied in metal material coating process, vacuum evaporation plating, coating and other directions, can solve the problems of uneven thickness and long uneven range of packaging inorganic layer film, and achieve long-term use The effect of high stability, high production yield and high yield

Active Publication Date: 2022-07-29
BOE TECH GRP CO LTD +1
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

refer to figure 1 , due to the sagging phenomenon of the metal mask 100 under the action of gravity, the gap (Gap) value G between the central area A and the edge area B and the substrate 200 is different, resulting in the film packaging inorganic layer at different positions Uneven thickness, especially ref. figure 2 , resulting in a film thickness of 10% to 90% of the thickness gradient area (Shadow) C non-uniformity range is longer

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Metal reticle, display panel and display device
  • Metal reticle, display panel and display device
  • Metal reticle, display panel and display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0045] The embodiments of the present invention will be described in detail below, and those skilled in the art will understand that the following embodiments are intended to explain the present invention and should not be regarded as a limitation of the present invention. Unless otherwise specified, specific techniques or conditions are not explicitly described in the following examples, and those skilled in the art can follow common techniques or conditions in the art or follow product specifications.

[0046] In one aspect of the present invention, the present invention provides a metal reticle.

[0047] According to an embodiment of the present invention, refer to image 3 The metal mask 100 includes an opening area O and a peripheral area R, the peripheral area R is arranged around the opening area O, and the peripheral area R is provided with a first half groove 101 , and the first half groove 101 is arranged around the opening area O. In this way, on the basis of the c...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
widthaaaaaaaaaa
Login to view more

Abstract

The present invention proposes a metal mask, a display panel and a display device. The metal mask includes an opening area and a peripheral area, the peripheral area is arranged around the opening area, and the peripheral area is provided with a first half notch, and the first half notch is arranged around the opening area. The metal reticle proposed by the present invention can effectively improve the sag of the metal reticle and reduce the tension of the metal reticle by introducing the first half-grooves arranged around the opening area in the peripheral area, thereby improving the use of the metal reticle. The thickness uniformity of the inorganic encapsulation layer formed by the reticle at different positions further increases the production yield of the display panel.

Description

technical field [0001] The present invention relates to the technical field of display manufacturing, and in particular, the present invention relates to a metal mask, a display panel and a display device. Background technique [0002] In the current active matrix organic light emitting diode (AMOLED) thin film encapsulation technology, a metal mask (Mask) is used to pattern the encapsulated inorganic layer. refer to figure 1 , because the metal reticle 100 sags under the action of gravity, the gap (Gap) value G between the center region A and the edge region B and the substrate 200 is different, resulting in the film encapsulating the inorganic layer at different positions Uneven thickness, especially reference figure 2 , resulting in a longer non-uniformity range of the thickness gradient region (Shadow) C of the film thickness between 10% and 90%. SUMMARY OF THE INVENTION [0003] The present invention is accomplished based on the following findings of the inventors...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): H01L51/56H01L51/52H01L27/32
CPCH10K59/12H10K50/844H10K71/00C23C14/042
Inventor 王世龙蒋志亮
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products