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Wet etching apparatus and substrate wet etching method

A wet etching and substrate technology, which is applied in the field of display panels, can solve the problems of incomplete etching and residual reactants, etc., and achieve the effects of reducing incomplete etching, effective contact, and easy diffusion

Active Publication Date: 2020-04-10
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The present invention provides a wet etching device and a substrate wet etching method to alleviate the problems of residual reactants and incomplete etching in the wet etching process of existing display panels

Method used

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  • Wet etching apparatus and substrate wet etching method
  • Wet etching apparatus and substrate wet etching method
  • Wet etching apparatus and substrate wet etching method

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preparation example Construction

[0043] In the manufacturing process of the display panel, the wet etching mainly includes a developing process of the photoresist and a wet etching process of the metal conductive film.

[0044] The development process of photoresist refers to the process of dissolving the exposed positive photoresist or the unexposed negative photoresist into the developing solution to remove it. In this process, the etching solution is a developer solution, and the etching solution for positive photoresist includes strong alkaline sodium hydroxide or potassium hydroxide aqueous solution, aqueous solution of tetramethylammonium hydroxide, etc., and the etching solution for negative photoresist Etching solution includes strong alkaline sodium hydroxide or potassium hydroxide aqueous solution, weak alkaline bicarbonate aqueous solution, etc.

[0045] The wet etching process of the metal conductive film refers to the process of removing the film to be etched, protecting the non-etched film, and ...

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Abstract

The invention provides a wet etching device and a substrate wet etching method. The wet etching device comprises an etching cavity, etching liquid and an intra-cavity transmission component, and in the etching process, and an included angle formed by a plane where the intra-cavity transmission component is located and a horizontal plane is an acute angle; the intra-cavity transmission component isarranged to be at a certain angle, the substrate is conveyed in an inclined state in the etching process, by means of the acting force of etching liquid on the surface of the substrate, the replacement effect of materials on the surface of the substrate and the etching liquid is enhanced, reaction products can be diffused more easily, and the risk that the reaction products remain in graph areas(holes, corners and the like), not prone to diffusion, of the substrate is reduced; and meanwhile, the etching liquid can be in more effective contact with the material to be reacted, so that the occurrence of incomplete etching is reduced, and high-quality etching patterns can be obtained.

Description

technical field [0001] The invention relates to the field of display panels, in particular to a wet etching device and a substrate wet etching method. Background technique [0002] In the manufacturing process of the display panel, wet etching refers to the process of selectively contacting the etching solution with the material on the surface of the substrate to react and obtain a specific pattern. Therefore, the mutual contact of the reactants, the uniform occurrence of the reaction, and the outward diffusion of the reaction products are very important factors in the panel manufacturing process. [0003] The tape-outs of the currently used wet etching machines are all carried out at the same height in the same direction. If some deep holes with small sizes are obtained after the reaction, due to the lack of replacement effect, on the one hand, it is difficult for the reaction product to pass through the holes. Diffusion out, which will cause the risk of reaction product r...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/306
CPCH01L21/67075H01L21/30604
Inventor 彭钊
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD